MBE deposition method employing effusion cell having a unibody crucible
DCFirst Claim
Patent Images
1. A method for depositing a thin film of material epitaxially on a substrate located within a vacuum growth chamber, comprising:
- providing an effusion cell comprising;
a support assembly comprising a mounting flange and at least one support post extending from the mounting flange; and
a head assembly connected to the at least one support post, the head assembly comprising a container for holding the material and a heater surrounding at least a portion of the container for heating the material in the container, the container comprising a rigid wall structure enclosing an interior space, said wall structure defining a base portion and a neck portion attached to the base portion, the neck portion having a negative draft angle extending away from the base portion and terminating in a neck orifice, the base portion having a first peripheral dimension and the neck orifice having a second peripheral dimension, said second peripheral dimension being less than said first peripheral dimension;
placing the material to be deposited on the substrate within said container;
mounting the effusion cell to the growth chamber such that the head assembly is located within the growth chamber and the orifice of the container is directed toward the substrate; and
forming a molecular beam of material by heating the material in the container under conditions sufficient to form the molecular beam which effuses out of the container and is deposited epitaxially on the substrate.
1 Assignment
Litigations
0 Petitions
Accused Products
Abstract
A unibody, monolithic, one-piece negative draft crucible for a MBE effusion cell. The crucible maximizes capacity, uniformity and long term flux stability, and minimizes oval defects, depletion effects, and short term shutter-related flux transients. The invention also provides a method and mandrel apparatus for making a unibody containment structure, such as a crucible formed of PBN, having a negative draft, via chemical vapor deposition.
57 Citations
10 Claims
-
1. A method for depositing a thin film of material epitaxially on a substrate located within a vacuum growth chamber, comprising:
-
providing an effusion cell comprising; a support assembly comprising a mounting flange and at least one support post extending from the mounting flange; and a head assembly connected to the at least one support post, the head assembly comprising a container for holding the material and a heater surrounding at least a portion of the container for heating the material in the container, the container comprising a rigid wall structure enclosing an interior space, said wall structure defining a base portion and a neck portion attached to the base portion, the neck portion having a negative draft angle extending away from the base portion and terminating in a neck orifice, the base portion having a first peripheral dimension and the neck orifice having a second peripheral dimension, said second peripheral dimension being less than said first peripheral dimension; placing the material to be deposited on the substrate within said container; mounting the effusion cell to the growth chamber such that the head assembly is located within the growth chamber and the orifice of the container is directed toward the substrate; and forming a molecular beam of material by heating the material in the container under conditions sufficient to form the molecular beam which effuses out of the container and is deposited epitaxially on the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
Specification