Pixel structure, image sensor using such pixel structure and corresponding peripheral circuitry
DCFirst Claim
1. A pixel structure for use in an image sensor manufactured in CMOS technology in accordance with layout rules defined for a specific CMOS manufacturing process, the pixel structure comprising:
- a photosensitive element;
a load transistor in series with the photosensitive element, the load transistor having a gate;
means comprising at least another transistor, coupled to said photosensitive element and said load transistor, for reading out signals acquired in said photosensitive element and converted to a voltage drop across said load transistor, wherein at least the gate of the load transistor has a length which is at least 10% larger than a gate length of transistors including at least said another transistor, manufactured according to the layout rules of the specific CMOS manufacturing process, thereby increasing the light sensitivity of said pixel structure.
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Abstract
A pixel structure for CMOS imaging applications, the pixel structure including a photosensitive element, a load transistor in series with the photosensitive element, a first reading transistor, coupled to the photosensitive element and to the load transistor, for reading out signals acquired in the photosensitive element and converting the signals to a voltage drop across the load transistor. The gate length of at least the load transistor is increased by at least 10% compared to a gate length of transistors manufactured according to layout rules imposed by a CMOS manufacturing process, thereby increasing the light sensitivity of the pixel structure.
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Citations
9 Claims
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1. A pixel structure for use in an image sensor manufactured in CMOS technology in accordance with layout rules defined for a specific CMOS manufacturing process, the pixel structure comprising:
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a photosensitive element; a load transistor in series with the photosensitive element, the load transistor having a gate; means comprising at least another transistor, coupled to said photosensitive element and said load transistor, for reading out signals acquired in said photosensitive element and converted to a voltage drop across said load transistor, wherein at least the gate of the load transistor has a length which is at least 10% larger than a gate length of transistors including at least said another transistor, manufactured according to the layout rules of the specific CMOS manufacturing process, thereby increasing the light sensitivity of said pixel structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for increasing light sensitivity of a pixel structure for use in an image sensor manufactured in CMOS technology in accordance with layout rules defined for a specific CMOS manufacturing process, comprising the steps of:
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providing a photosensitive element; providing a load transistor having a gate, the gate having a length which is at least 10% larger than gate lengths of transistors manufactured according to the layout rules imposed by the specific CMOS manufacturing process; connecting the photosensitive element in series with the load transistor; coupling a read circuit, comprising at least another transistor, to the photosensitive element and the load transistor, the read circuit configured to read out signals acquired in the photosensitive element and converted to a voltage drop across the load transistor.
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Specification