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Method and device for producing features on a photolithographic layer

  • US 5,936,713 A
  • Filed: 01/29/1998
  • Issued: 08/10/1999
  • Est. Priority Date: 06/23/1995
  • Status: Expired due to Term
First Claim
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1. A method for structuring a photolithographic layer, comprising the following steps:

  • a) creating a first pattern on a first plane light modulator, where the first plane light modulator comprises a plurality of picture elements, where the first pattern is defined by a prescribed number of addressed picture elements;

    b) imaging the first pattern onto a region to be exposed of the layer to be structured;

    c) creating a second pattern on a second plane light modulator, where the second plane light modulator comprises a plurality of picture elements, where the second pattern comprises a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to the first region a second region of addressed picture elements; and

    d) imaging the second pattern onto the region to be exposed of the layer to be structured;

    wherein the first and the second pattern are imaged simultaneously onto the region to be exposed of the layer to be structured; and

    wherein said first pattern is imaged with a first intensity and said second pattern is imaged with a second intensity, said first and second intensities being below the intensities necessary to image the complete first pattern and the complete second pattern.

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