Method and device for producing features on a photolithographic layer
First Claim
1. A method for structuring a photolithographic layer, comprising the following steps:
- a) creating a first pattern on a first plane light modulator, where the first plane light modulator comprises a plurality of picture elements, where the first pattern is defined by a prescribed number of addressed picture elements;
b) imaging the first pattern onto a region to be exposed of the layer to be structured;
c) creating a second pattern on a second plane light modulator, where the second plane light modulator comprises a plurality of picture elements, where the second pattern comprises a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to the first region a second region of addressed picture elements; and
d) imaging the second pattern onto the region to be exposed of the layer to be structured;
wherein the first and the second pattern are imaged simultaneously onto the region to be exposed of the layer to be structured; and
wherein said first pattern is imaged with a first intensity and said second pattern is imaged with a second intensity, said first and second intensities being below the intensities necessary to image the complete first pattern and the complete second pattern.
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Accused Products
Abstract
In a method for structuring a photolithographic layer a first pattern is ated on a first plane light modulator. The first plane light modulator comprises a plurality of picture elements, and the first pattern is defined by a prescribed number of addressed picture elements. Then a second pattern is created on a second plane light modulator. The second plane light modulator comprises a plurality of picture elements, and the second pattern has a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to this a second region of addressed picture elements. Finally the first and the second pattern are imaged onto a region to be exposed of the layer to be structured.
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Citations
15 Claims
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1. A method for structuring a photolithographic layer, comprising the following steps:
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a) creating a first pattern on a first plane light modulator, where the first plane light modulator comprises a plurality of picture elements, where the first pattern is defined by a prescribed number of addressed picture elements; b) imaging the first pattern onto a region to be exposed of the layer to be structured; c) creating a second pattern on a second plane light modulator, where the second plane light modulator comprises a plurality of picture elements, where the second pattern comprises a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to the first region a second region of addressed picture elements; and d) imaging the second pattern onto the region to be exposed of the layer to be structured; wherein the first and the second pattern are imaged simultaneously onto the region to be exposed of the layer to be structured; and wherein said first pattern is imaged with a first intensity and said second pattern is imaged with a second intensity, said first and second intensities being below the intensities necessary to image the complete first pattern and the complete second pattern. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A device for structuring a photolithographic layer, comprising:
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a first plane light modulator with a plurality of picture elements for creating a first pattern, which is defined by a prescribed number of addressed picture elements; an imaging device, which images the first pattern onto a region to be exposed of the layer to be structured; and a second plane light modulator with a plurality of picture elements for creating a second pattern, which comprises a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to the first region a second region of addressed picture elements; wherein the imaging device images the second pattern onto the region to be exposed of the layer to be structured; wherein the imaging device images the first and the second pattern simultaneously onto the region to be exposed of the layer to be structured; and wherein said first pattern is imaged with a first intensity and said second pattern is imaged with a second intensity, said first and second intensities being below the intensities necessary to image the complete first pattern and the complete second pattern. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15)
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Specification