Deformable mirror device and manufacturing method thereof
First Claim
1. A method of manufacturing a deformable mirror device, comprising, stated in the following order, the steps of:
- forming an electrode layer on a substrate in a predetermined pattern;
forming a thick film on upper surfaces of said substrate and said electrode layer;
forming a support plate having a predetermined pattern on an upper surface of said thick film;
situating a mask having a predetermined pattern on an upper surface of said support plate and partially etching said support plate and said thick film to form at least one through hole;
coating a photoresist on the upper surface of said support plate and within said through hole and exposing and etching said coated photoresist using a mask having a predetermined pattern so that edge portions of said support plate are removed, thereby to separate said support plate from adjacent support plates;
forming a post on one side of an inner surface of said through hole by a sputtering process;
forming a reflecting plate on an upper surface of said support plate; and
removing said thick film.
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Accused Products
Abstract
A deformable mirror device and manufacturing method therefor. The method includes the steps of forming an electrode layer on a substrate in a predetermined pattern, forming a thick film on the upper surfaces of the substrate and the electrode layer, forming a support plate on the upper surface of the thick film, and partially etching the thick film to form at least one through hole. The method further includes separating the support plate into single portions, forming a post on one side of the inner surface of the through hole, forming a reflecting plate on the upper surface of the support plate, and removing the thick film.
33 Citations
8 Claims
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1. A method of manufacturing a deformable mirror device, comprising, stated in the following order, the steps of:
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forming an electrode layer on a substrate in a predetermined pattern; forming a thick film on upper surfaces of said substrate and said electrode layer; forming a support plate having a predetermined pattern on an upper surface of said thick film; situating a mask having a predetermined pattern on an upper surface of said support plate and partially etching said support plate and said thick film to form at least one through hole; coating a photoresist on the upper surface of said support plate and within said through hole and exposing and etching said coated photoresist using a mask having a predetermined pattern so that edge portions of said support plate are removed, thereby to separate said support plate from adjacent support plates; forming a post on one side of an inner surface of said through hole by a sputtering process; forming a reflecting plate on an upper surface of said support plate; and removing said thick film. - View Dependent Claims (2, 3, 4)
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5. A method of manufacturing a deformable mirror device, comprising, as stated in the following order, the steps of:
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forming an electrode layer on a substrate in a predetermined pattern; forming a thick film on upper surfaces of said substrate and said electrode layer; situating a mask having a predetermined pattern on an upper surface of said thick film and partially etching said thick film to form at least one through hole; coating a photoresist within said through hole and exposing and etching said coated photoresist using a mask having a predetermined pattern so that edge portions of said support plate are removed, thereby to separate said support plate from adjacent support plates; forming a post on one side of an inner surface of said through hole by a sputtering process; forming a support plate on the upper surface of said thick film; forming a photoresist layer within said through hole; forming a reflecting plate on said support plate and said photoresist layer to fill up an upper part of said through hole; and removing said thick film and said photoresist layer. - View Dependent Claims (6, 7, 8)
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Specification