Functional product
First Claim
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1. A method for forming a functional product, comprising the steps of:
- forming a functional film above a substrate; and
forming a first oxide film above said substrate, by sputtering a target;
wherein said first oxide film comprises tin and silicon, andsaid first oxide film has an atomic ratio of tin defined as Sn/(Sn+Si) in a range of 30-90%.
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Abstract
A functional product comprising at least one layer of a thin film having a function formed above a substrate; and at least one layer of an oxide film whose major component is an oxide containing tin and silicon, formed above the substrate.
44 Citations
22 Claims
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1. A method for forming a functional product, comprising the steps of:
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forming a functional film above a substrate; and forming a first oxide film above said substrate, by sputtering a target; wherein said first oxide film comprises tin and silicon, and said first oxide film has an atomic ratio of tin defined as Sn/(Sn+Si) in a range of 30-90%. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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Specification