Semiconductor detector for infrared radiation and method for manufacturing same
First Claim
1. A method for manufacturing a semiconductor detector for infrared radiation, comprising the steps of:
- depositing an auxiliary layer on a primary surface of a carrier;
depositing a membrane layer, with at least one opening therein, onto said auxiliary layer;
selectively etching said auxiliary layer through said at least one opening in said membrane layer for producing a hollow space in said auxiliary layer;
sealing said hollow space by depositing a covering over said membrane layer; and
depositing infrared radiation-sensitive material on said covering within a region of said covering limited by the hollow space therebelow.
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Accused Products
Abstract
A semiconductor detector for infrared radiation is manufactured by the steps of depositing an auxiliary layer on a main surface of a carrier, depositing a membrane layer provided with at least one opening onto the auxiliary layer, selectively etching the auxiliary layer through the at least one opening of the membrane layer, so that a hollow space arises in the auxiliary layer, sealing the hollow space by depositing a covering on th membrane layer, and fashioning a detector element on the covering by depositing a material sensitive to infrared radiation within a region of the covering that is bounded by the hollow space therebelow.
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Citations
23 Claims
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1. A method for manufacturing a semiconductor detector for infrared radiation, comprising the steps of:
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depositing an auxiliary layer on a primary surface of a carrier; depositing a membrane layer, with at least one opening therein, onto said auxiliary layer; selectively etching said auxiliary layer through said at least one opening in said membrane layer for producing a hollow space in said auxiliary layer; sealing said hollow space by depositing a covering over said membrane layer; and depositing infrared radiation-sensitive material on said covering within a region of said covering limited by the hollow space therebelow. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A semiconductor detector for infrared radiation, comprising:
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a carrier and auxiliary layer deposited on a primary surface of said carrier; a membrane layer, with at least one opening therein, deposited onto said auxiliary layer; said auxiliary layer having at least one hollow space therein selectively etched through said at least one opening in said membrane layer; a covering deposited over said membrane layer and sealing said hollow space; and infrared radiation-sensitive material deposited on said covering within a region of said covering limited by the hollow space therebelow. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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Specification