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Plasma monitoring and control method and system

  • US 5,939,886 A
  • Filed: 11/18/1996
  • Issued: 08/17/1999
  • Est. Priority Date: 10/24/1994
  • Status: Expired due to Term
First Claim
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1. A method for monitoring the radio frequency power of a plasma in an electronic device fabrication reactor, comprising the steps of:

  • sensing the voltage of the radio frequency power directed to a plasma-producing gas at the input to the plasma-producing environment of the electronic device fabrication reactor;

    sensing the current of the radio frequency power directed to the plasma-producing gas at the input to the plasma-producing environment;

    sensing the phase angle of the radio frequency power directed to the plasma-producing gas at the input to the plasma-producing environment; and

    measuring the full-load impedance associated with the plasma-producing environment.

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