Light absorptive antireflector

• US 5,942,319 A
• Filed: 08/25/1997
• Issued: 08/24/1999
• Est. Priority Date: 12/13/1994
• Status: Expired due to Term

• Current Assignee: Asahi Glass Company, Limited (AGC, Inc.)
• Original Assignee: Asahi Glass Company, Limited (AGC, Inc.)
• Inventors: Oyama, Takuji, Katayama, Yoshihito
• Primary Examiner(s): TURNER, ARCHENE A
• Application Number:
  US08/917,177
• Time in Patent Office: 729 Days
• Field of Search: 428/432, 428/216, 428/698, 428/446, 428/336, 428/212, 428/412, 428/469, 428/472, 428/912, 313/461, 359/359, 359/580, 359/585, 427/162, 427/163.3, 427/164, 427/166
• US Class Current: 428/216
• CPC Class Codes: G02B 1/116 including electrically conducting layers
• CPC Class Codes: Y10S 428/912 Puncture healing layer
• CPC Class Codes: Y10T 428/24942 including components having same physical characteristic in differing degree
• CPC Class Codes: Y10T 428/24975 No layer or component greater than 5 mils thick
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/31507 Of polycarbonate

Abstract

A light absorptive antireflector comprising a substrate, a light absorbing film formed on the substrate and a silica film formed on the light absorbing film, to reduce reflection of incident light from the silica film side, wherein the geometrical film thickness of the light absorbing film is from 5 to 25 nm, and the geometrical film thickness of the silica film is from 70 to 110 nm.

Claims

1. A light absorptive antireflector comprising a substrate, a single light absorbing film, wherein the light absorbing film is formed on the substrate, and a silica film formed on the light absorbing film, to reduce reflection of incident light from the silica film side,

wherein the light absorbing film is a film consisting essentially of a nitride of titanium, and

the film consisting essentially of a nitride of titanium, is a film containing oxygen in an amount of from about 0.06 to at most 0.5 as an atomic ratio to titanium,

wherein the geometrical film thickness of the light absorbing film is from 5 to 25 nm, and the geometrical film thickness of the silica film is from 70 to 110 nm.

2. The light absorptive antireflector according to claim 1, wherein the geometrical film thickness of the light absorbing film is from 7 to 20 nm.

3. The light absorptive antireflector according to claim 1, wherein the geometrical film thickness of the light absorbing film is from 10 to 20 nm.

4. The light absorptive antireflector according to claim 1, wherein the geometrical film thickness of the light absorbing film is from 7 to 15 nm.

5. The light absorptive antireflector according to claim 1, wherein the geometrical film thickness of the silica film is from 80 to 100 nm.

6. The light absorptive antireflector according to claim 1, wherein the light absorption of the light absorptive antireflector is from 10 to 35% to the incident light from the silica film side.

7. The light absorptive antireflector according to claim 1, wherein the reflectance of the light absorptive antireflector to the incident light from the silica film side does not exceed 0.6% in a wavelength region of from 500 to 650 nm.

8. The light absorptive antireflector according to claim 1, wherein a layer consisting essentially of a metal or metal nitride and having a geometrical film thickness of from 1 to 20 nm, is formed between the light absorbing film and the silica film.

9. The light absorptive antireflector according to claim 8, wherein the layer consisting essentially of the metal or metal nitride, is a layer consisting essentially of silicon or silicon nitride.

10. The light absorptive antireflector according to claim 1, wherein the substrate is a glass substrate, a plastic substrate or a plastic film, which constitutes the front surface of a display screen.

11. The light absorptive antireflector according to claim 1, wherein the substrate is a panel glass, constituting a cathode ray tube.

12. The light absorptive antireflector according to claim 1, wherein the reflectance of the light absorptive antireflector to the incident light from the silica film side after heating does not exceed 0.6% in a wavelength region of from 500 to 650 nm.

13. A method of producing a cathode ray tube with a light absorptive antireflector, comprising forming a light absorbing film on a panel glass for a cathode ray tube, forming a silica film on the light absorbing film, and heating the panel glass to obtain a cathode ray tube, wherein the light absorbing film is a film consisting essentially of a nitride of titanium, and the film consisting essentially of a nitride of titanium, is a film containing oxygen in an amount of at most 0.5 as an atomic ratio to titanium.