Varying multipole plasma source

• US 5,944,942 A
• Filed: 03/04/1998
• Issued: 08/31/1999
• Est. Priority Date: 03/04/1998
• Status: Expired due to Fees

• Current Assignee: John Seldon Ogle
• Original Assignee: John Seldon Ogle
• Inventors: Ogle, John Seldon
• Primary Examiner(s): Breneman, Bruce
• Assistant Examiner(s): FIELER, ERIN L
• Application Number:
  US09/034,727
• Time in Patent Office: 545 Days
• Field of Search: 118/723, 156/345
• US Class Current: 156/345.46
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

Gas diffuser bolt (35) is used to improve process gas flow from near the center of process chamber (40) across workpiece (58) to exhaust ports near the periphery of process chamber (40), process nonuniformity is improved by adjusting the vertical position of each varying magnetic pole (10) relative to two-pole rounded oblong dielectric window (22), differential driving of metal voltage reference plate (18) and workpiece electrode (60) reduce the voltage between the plasma and process chamber (40), reducing particulates and improving efficiency, and temperature control of metal voltage reference plate (18) improves process chamber (40) cleaning.

Claims

1. A low pressure plasma source, comprising:

a process chamber for enclosing process gases at reduced pressures and including means for controlling gas pressure and flow, and

a workpiece mounted on a workpiece electrode inside said process chamber, and

a metal voltage reference plate forming a surface of said chamber, said metal voltage reference plate having two or more rounded oblong holes, and

two or more rounded oblong dielectric windows mounted in said rounded oblong holes in said metal voltage reference plate with means for providing gas tight seals between said rounded oblong dielectric windows and said metal voltage reference plate, and

two or more pairs of opposite polarity varying magnetic poles, with each pair of said opposite polarity varying magnetic poles mounted in proximity to one of said rounded oblong dielectric windows, such that varying magnetic fields between said opposite polarity magnetic poles couple through said rounded oblong dielectric windows and generate a plasma inside said process chamber.

2. The plasma source of claim 1, further including:

One or more gas diffusers mounted in said metal voltage reference plate, with each of said gas diffusers having multiple gas introduction holes which introduce process gases into said process chamber with a velocity component parallel to the surface of said metal voltage reference plate, with each said gas diffuser either integral with said metal voltage reference plate or in the form of a gas diffuser bolt mounted in a hole in said metal voltage reference plate.

3. The plasma source of claim 1, further including:

means for driving said workpiece electrode with a radio frequency voltage of the same frequency as the frequency of said opposite polarity varying magnetic poles, and

means for establishing a desired phase relationship between said radio frequency voltage and said varying magnetic poles.

4. The plasma source of claim 1, further including:

electrical insulation between said metal voltage reference plate and said process chamber, and

means for driving said metal voltage reference plate with a radio frequency voltage relative to said chamber.

5. The plasma source of claim 1, further including:

electrical insulation between said metal voltage reference plate and said chamber, and

electrical insulation between said workpiece electrode and said chamber, and

means for driving both said workpiece electrode and said metal voltage reference plate with opposite polarity radio frequency voltages relative to said chamber.

6. The plasma source of claim 1, further including:

electrical insulation between said metal voltage reference plate and said chamber, and

electrical insulation between said workpiece electrode and said chamber, and

means for measuring the radio frequency voltage between said plasma and said chamber, and

means for driving both said workpiece electrode and said metal voltage reference plate with opposite polarity and variable ratio radio frequency voltages between said workpiece electrode and said process chamber and between said metal voltage reference plate and said process chamber, with said variable ratio voltages adjusted for satisfactorily low radio frequency voltage between said plasma and said process chamber.

7. The plasma source of claim 1, further providing that said pairs of opposite polarity varying magnetic poles consist of varying electric current flowing through coils wound around the ends of a U shaped ferromagnetic core, with said U shaped ferromagnetic core comprised of multiple U shaped layers of thin ferromagnetic material, separated by spaces to allow the flow of cooling fluids.

8. The plasma source of claim 1, further including:

thermal insulation between said metal voltage reference plate and said process chamber, and

means for controlling the temperature of said metal voltage reference plate.