Computer implemented method for estimating fabrication yield for semiconductor integrated circuit including memory blocks with redundant rows and/or columns
First Claim
1. A computer implemented method for estimating a fabrication yield for a semiconductor product under design including a plurality of design integrated circuit dies, each of which includes a memory cache having a predetermined redundancy scheme, comprising the steps of:
- (a) performing a bitmap failure analysis of an existing semiconductor product including a plurality of existing integrated circuit dies having bitmap failure modes that are comparable to those of the design dies to obtain a number of failed caches;
(b) calculating an observed repair rate as a ratio of a number of said failed caches that can be repaired by the predetermined redundancy scheme to a total of said number of failed caches;
(c) computing, using a computer, a model repair rate for the predetermined redundancy scheme which approximates the observed repair rate using a discrete multivariate probability distribution model including computed average numbers λ
of failures for the failure modes respectively; and
(d) calculating the fabrication yield as a predetermined function of the model repair rate including a scale factor for the semiconductor product under design.
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Accused Products
Abstract
A computer is used to estimate a fabrication yield for a semiconductor product under design which includes a plurality of integrated circuit dies, each of which includes a memory cache having a predetermined redundancy scheme in the form of redundant rows and/or columns. A bitmap failure analysis of an existing semiconductor product including a plurality of integrated circuit dies having bitmap failure modes that are comparable to those of the product being designed is performed to obtain a number of failed caches. An observed repair rate is computed as a ratio of a number of the failed caches that can be repaired by the predetermined redundancy scheme to the number of failed caches. A model repair rate for the predetermined redundancy scheme which approximates the observed repair rate is computed using a multiple Poisson model including computed average numbers λ of failures for the failure modes respectively. The numbers λ are optimized by minimizing a least squares difference between the observed repair rates and the model repair rates. The fabrication yield is computed as a predetermined function of the model repair rate including scale factor(s) for the circuit on the wafer being designed. The method can be used to select a redundancy scheme for the wafer by computing fabrication yields for a plurality of candidate redundancy schemes, and selecting the redundancy scheme which has the highest return for additional test, manufacturing and design investment.
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Citations
23 Claims
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1. A computer implemented method for estimating a fabrication yield for a semiconductor product under design including a plurality of design integrated circuit dies, each of which includes a memory cache having a predetermined redundancy scheme, comprising the steps of:
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(a) performing a bitmap failure analysis of an existing semiconductor product including a plurality of existing integrated circuit dies having bitmap failure modes that are comparable to those of the design dies to obtain a number of failed caches; (b) calculating an observed repair rate as a ratio of a number of said failed caches that can be repaired by the predetermined redundancy scheme to a total of said number of failed caches; (c) computing, using a computer, a model repair rate for the predetermined redundancy scheme which approximates the observed repair rate using a discrete multivariate probability distribution model including computed average numbers λ
of failures for the failure modes respectively; and(d) calculating the fabrication yield as a predetermined function of the model repair rate including a scale factor for the semiconductor product under design. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A computer implemented method for creating a fabrication yield model for a semiconductor product under design including a plurality of design integrated circuit dies, each of which includes a memory cache having a predetermined redundancy scheme, comprising the steps of:
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(a) performing a bitmap failure analysis of an existing semiconductor product including a plurality of existing integrated circuit dies having bitmap failure modes that are comparable to those of the design dies to obtain a number of failed caches; (b) calculating an observed repair rate as a ratio of a number of said failed caches that can be repaired by the predetermined redundancy scheme to a total of said number of failed caches; (c) creating a multivariate probability distribution model on a computer including average numbers λ
of failures for the failure modes respectively;(d) calculating, using the model on the computer, model repair rates as ratios of numbers of said failed caches that can be repaired by a plurality of redundancy schemes to a total of said number of failed caches for at least as many redundancy schemes as failure modes respectively; and (d) optimizing the numbers λ
using a computer such that the model repair rates most closely approximate the observed repair rates respectively by minimizing a least squares difference between the observed repair rates and the model repair rates. - View Dependent Claims (21, 22, 23)
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Specification