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High pressure liquid/gas storage frame for a pressurized liquid cleaning apparatus

  • US 5,946,945 A
  • Filed: 12/24/1997
  • Issued: 09/07/1999
  • Est. Priority Date: 12/24/1997
  • Status: Expired due to Term
First Claim
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1. An apparatus for removing a contaminant from a substrate using a pressurized cleaning fluid comprising, in combination:

  • a substrate cleaning vessel having an inlet for introducing substantially uncontaminated pressurized cleaning fluid and an outlet for removing a solution of the contaminant in the pressurized cleaning fluid;

    a cleaning fluid recovery device for separating the contaminant from the cleaning fluid to provide substantially uncontaminated cleaning fluid at a recovery device outlet, the cleaning fluid recovery device being in fluid communication with the substrate cleaning vessel through the cleaning vessel outlet; and

    a structural framework supporting the substrate cleaning vessel and the solvent recovery device comprising a plurality of interconnected hollow structures in fluid communication with the substrate cleaning vessel for receiving and storing the pressurized cleaning fluid.

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