Static random access memory cell having a thin film transistor (TFT) pass gate connection to a bit line
First Claim
1. A static random access memory cell comprising:
- a voltage terminal;
means for storing a binary value coupled to the voltage terminal comprising two cross-coupled inverters;
a select gate having a first terminal coupled to the means for storing and a second terminal, wherein the select gate is further characterized as being a transmission gate which comprises at least one thin film transistor (TFT) overlying another transistor; and
a conductor coupled to the second terminal of the select gate to bit line detection circuitry.
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Accused Products
Abstract
A memory circuit and method of formation uses a transmission gate (24) as a select gate. The transmission gate (24) contains a transistor (30) which is an N-channel transistor and a transistor (28) which is a P-channel transistor. The transistors (28 and 30) are electrically connected in parallel. The use of the transmission gate (24) as a select gate allows reads and writes to occur to a memory cell storage device (i.e. a capacitor (32), a floating gate (22), etc.) without a significant voltage drop occurring across the transmission gate. In addition, EEPROM technology is more compatible with EPROM/flash technology when using a transmission gate as a select gate within EEPROM devices.
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Citations
21 Claims
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1. A static random access memory cell comprising:
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a voltage terminal; means for storing a binary value coupled to the voltage terminal comprising two cross-coupled inverters; a select gate having a first terminal coupled to the means for storing and a second terminal, wherein the select gate is further characterized as being a transmission gate which comprises at least one thin film transistor (TFT) overlying another transistor; and a conductor coupled to the second terminal of the select gate to bit line detection circuitry.
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2. A static random access memory (SRAM) device comprising:
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a storage device having at least one pull up transistor coupled between a first power supply terminal and a storage node and a pull down transistor coupled between a second power supply terminal and the storage node; and a pass device coupled between the storage node and a bit line conductor, the pass device having a first transistor formed in a substrate and coupled between the storage node and the bit line conductor and a second transistor overlying the first transistor and coupled between the storage node and the bit line conductor. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A static random access memory (SRAM) device comprising:
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a first inverter having a first P channel pull up transistor coupled between a power supply terminal and a first storage node and a first N channel pull down transistor coupled between the first storage node and a ground supply terminal, a gate electrode of the first P channel pull up transistor being coupled to a gate electrode of the first N channel pull down transistor to form a first interconnected gate structure; a second inverter having a second P channel pull up transistor coupled between the power supply terminal and a second storage node and a second N channel pull down transistor coupled between the second storage node and the ground supply terminal, a gate electrode of the second P channel pull up transistor being coupled to a gate electrode of the second N channel pull down transistor to form a second interconnected gate structure; a first conductive portion coupling the first interconnected gate structure to the second storage node and a second conductive portion coupling the second interconnected gate structure to the first storage node; and a thin film transistor overlying a substrate and coupled between the first storage node and a bit line conductor. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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21. A static random access memory (SRAM) device comprising:
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a first inverter having a first P channel TFT pull up transistor coupled between a power supply terminal and a first storage node and a first N channel pull down transistor coupled between the first storage node and a ground supply terminal, a gate electrode of the first P channel TFT pull up transistor being coupled to a gate electrode of the first N channel pull down transistor to form a first interconnected gate structure; a second inverter having a second P channel TFT pull up transistor coupled between the power supply terminal and a second storage node and a second N channel pull down transistor coupled between the second storage node and the ground supply terminal, a gate electrode of the second P channel TFT pull up transistor being coupled to a gate electrode of the second N channel pull down transistor to form a second interconnected gate structure; a first conductive portion coupling the first interconnected gate structure to the second storage node and a second conductive portion coupling the second interconnected gate structure to the first storage node; a pass device having an N channel pass transistor formed in a silicon on insulator substrate and a P channel thin film transistor formed over the N channel pass transistor, the N channel pass transistor being separated from the P channel thin film transistor by a dielectric layer, the N channel pass transistor and the P channel thin film transistor each being coupled between the first storage node and a bit line conductor; and a trench isolation region adjacent the static random access memory (SRAM) device.
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Specification