Method of fabricating integrated thin film solar cells
First Claim
1. A method of fabricating integrated thin film solar cells, comprising:
- a step for forming a transparent conductive film on a transparent substrate having an insulative surface;
a first scribing step for segmenting the transparent conductive film to form transparent conductive film electrodes;
a step for forming an amorphous semiconductor layer on the resulting substrate having the transparent conductive film electrodes;
a second scribing step for segmenting the amorphous semiconductor layer to form amorphous semiconductor photoelectric conversion layers;
a step for forming a rear electrode layer on the resulting substrate having the amorphous semiconductor photoelectric conversion layers; and
a third scribing step for segmenting the rear electrode layer to form rear electrodes;
wherein the third scribing step includes forming a resist film on the rear electrode layer, forming trenches in the resist film by laser scribing, and etching off portions of the rear electrode layer with an etchant by using the resulting resist film as a mask.
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Accused Products
Abstract
A method is provided for fabricating solar cells. A transparent conductive film is formed on a transparent substrate having an insulative surface and the transparent conductive film is segmented by a first scribing step to form transparent conductive film electrodes. An amorphous semiconductor layer is formed on the resulting substrate having the transparent conductive film electrodes. The amorphous semiconductor layer is segmented by a second scribing step to form amorphous semiconductor photoelectric conversion layers. A rear electrode layer is formed on the resulting substrate having the amorphous semiconductor photoelectric conversion layers and this rear electrode layer is segmented by a third scribing step to form rear electrodes. The third scribing step includes forming a resist film on the rear electrode layer, forming trenches in the resist film by laser scribing and etching off portions of the rear electrode layer with an etchant by using the resulting resist film as a mask.
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Citations
17 Claims
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1. A method of fabricating integrated thin film solar cells, comprising:
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a step for forming a transparent conductive film on a transparent substrate having an insulative surface; a first scribing step for segmenting the transparent conductive film to form transparent conductive film electrodes; a step for forming an amorphous semiconductor layer on the resulting substrate having the transparent conductive film electrodes; a second scribing step for segmenting the amorphous semiconductor layer to form amorphous semiconductor photoelectric conversion layers; a step for forming a rear electrode layer on the resulting substrate having the amorphous semiconductor photoelectric conversion layers; and a third scribing step for segmenting the rear electrode layer to form rear electrodes; wherein the third scribing step includes forming a resist film on the rear electrode layer, forming trenches in the resist film by laser scribing, and etching off portions of the rear electrode layer with an etchant by using the resulting resist film as a mask. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of fabricating solar cells, comprising:
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successively forming transparent first electrodes, solar cells and second electrodes on the surface of a transparent substrate, wherein said second electrodes are formed by forming a second electrode layer over said solar cells, forming a resist over said second electrode layer, forming trenches in said resist by laser scribing, and etching off portions of said second electrode layer with an etchant using the laser-scribed resist film as a mask. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification