×

Method for forming cornered images on a substrate and photomask formed thereby

  • US 5,959,325 A
  • Filed: 08/21/1997
  • Issued: 09/28/1999
  • Est. Priority Date: 08/21/1997
  • Status: Expired due to Fees
First Claim
Patent Images

1. A memory chip, comprising a plurality of trench capacitors, a plurality of transistors coupled to respective ones of said trench capacitors, and a plurality of isolation regions between respective trench capacitors, said isolation regions being formed in isolation trenches having at least one dimension near a resolution limit of a photoexposure tool that photolithographically defined the isolation trenches, said isolation trenches having at least two sidewalls defining a sharp-edged corner, said isolation trenches at least partially overlapping said respective trench capacitors.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×