Method for forming cornered images on a substrate and photomask formed thereby

• US 5,959,325 A
• Filed: 08/21/1997
• Issued: 09/28/1999
• Est. Priority Date: 08/21/1997
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Hakey, Mark C., Horak, David V., Leidy, Robert K., Holmes, Steven J., Peng, Song, Ma, William Hsioh-Lien, Ferguson, Richard A., Adair, William J., Martino, Ronald M.
• Primary Examiner(s): Chaudhuri, Olik
• Assistant Examiner(s): Mao, Daniel H.
• Application Number:
  US08/917,009
• Time in Patent Office: 768 Days
• Field of Search: 257/302, 257/296-313, 438/386-392, 438/424-438
• US Class Current: 257/302
• CPC Class Codes: H01L 21/0332 characterised by their composition, e.g. multilayer masks, materials
• CPC Class Codes: H01L 21/0334 characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
• CPC Class Codes: H10B 12/0383 wherein the transistor is vertical
• CPC Class Codes: Y10S 438/942 Masking

Abstract

A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.

Claims

1. A memory chip, comprising a plurality of trench capacitors, a plurality of transistors coupled to respective ones of said trench capacitors, and a plurality of isolation regions between respective trench capacitors, said isolation regions being formed in isolation trenches having at least one dimension near a resolution limit of a photoexposure tool that photolithographically defined the isolation trenches, said isolation trenches having at least two sidewalls defining a sharp-edged corner, said isolation trenches at least partially overlapping said respective trench capacitors.

7. The memory chip of claim 1, wherein said isolation region isolates said trench capacitor from said transistor along a side of said isolation trench.

2. A semiconductor chip having a plurality of apertures therein defined by a photoexposure tool having a given resolution limit, wherein at least one dimension defined by two sidewalls of each of said plurality of apertures is near the given resolution limit of said photo exposure tool, said sidewalls intersecting at a sharp-edged corner.

3. The semiconductor chip of claim 2, wherein said plurality of apertures comprise a plurality of trenches formed in a semiconductor substrate, and wherein said plurality of trenches define pillars in said substrate.

4. The semiconductor chip of claim 3, wherein both a storage capacitor and a vertical FET are formed in each of said plurality of trenches as well as pillars adjacent thereto.

5. An integrated circuit chip comprising isolation trenches, wherein the integrated circuit chip is produced by a method comprising the steps of:

providing a substrate having a first layer of selectively etchable material thereon, wherein the substrate includes;

a layer of gate polysilicon on a surface of the substrate;

a layer of oxide on an upper surface of the gate polysilicon;

a layer of nitride on an upper surface of the layer of oxide;

a layer of organic material on an upper surface of the layer of nitride; and

a thin layer of oxide on an upper surface of the layer of organic material,

and wherein the first layer of selectively etchable material is a thin layer of nitride on an upper surface of the thin layer of oxide;

forming a plurality of parallel edged openings in the first layer of etchable material, wherein the openings are aligned to form pairs of straight-edged first regions, and wherein the forming of a plurality of parallel edged openings is accomplished by a process comprising using a photoexposure tool to expose a photoresist pattern;

depositing a layer of selectively etchable material over the openings in said first layer of etchable material;

forming a second plurality of parallel edged openings in the layer of etchable material, said second plurality of openings intersecting adjacent pairs of said straight-edged first regions forming a plurality of second regions bounded by two edges of one of said first regions and two edges of one of said second regions;

selectively etching the thin layer of oxide in the plurality of second regions;

removing remaining areas of the etchable material;

selectively etching the layer of organic material in the plurality of second regions;

selectively etching the layer of nitride in the plurality of second regions, thereby removing remaining areas of the thin layer of nitride;

selectively etching the layer of oxide in the plurality of second regions, thereby removing remaining areas of the thin layer of oxide;

selectively etching the layer of gate polysilicon, thereby exposing the substrate in the plurality of second regions;

processing the exposed second regions of the substrate to form isolation trenches, wherein the isolation trenches each have at least one dimension near a resolution limit of the photoexposure tool; and

processing the substrate in the second regions defined by said openings and said second openings.

6. An integrated circuit chip comprising deep trench capacitors, wherein the integrated circuit chip is produced by a method comprising the steps of:

providing a substrate having a first layer of selectively etchable material thereon, wherein the substrate includes;

a first layer of polysilicon on an upper surface of the substrate;

a first layer of silicon nitride on an upper surface of the first layer of polysilicon;

a first layer of silicon oxide on an upper surface of the first layer of silicon nitride;

a second layer of polysilicon on an upper surface of the first layer of silicon oxide; and

a second layer of silicon nitride on an upper surface of the second layer of polysilicon,

and wherein the first layer of selectively etchable material is a second layer of silicon oxide on an upper surface of the second layer of silicon nitride;

forming a plurality of parallel edged openings in the first layer of etchable material, wherein the openings are aligned to form pairs of straight-edged first regions, and wherein the forming of a plurality of parallel edged openings is accomplished by a process comprising using a photoexposure tool to expose a photoresist pattern;

depositing a layer of selectively etchable material over the openings in said first layer of etchable material;

forming a second plurality of parallel edged openings in the layer of etchable material, said second plurality of openings intersecting adjacent pairs of said straight-edged first regions forming a plurality of second regions bounded by two edges of one of said first regions and two edges of one of said second regions;

forming a plurality of cornered openings in the second layer of silicon nitride in the second regions defined by the first and second openings;

selectively etching the second layer of polysilicon to expose cornered areas of the first layer of silicon oxide;

selectively etching the first layer of silicon oxide to expose cornered areas of the first layer of silicon nitride, thereby removing any remaining portions of the second layer of silicon oxide;

selectively etching the first layer of silicon nitride to expose cornered areas of the first layer of polysilicon, thereby removing any remaining portions of the second layer of silicon nitride;

selectively etching the first layer of polysilicon to expose cornered areas of the substrate, thereby removing remaining portions of the second layer of polysilicon;

processing the exposed cornered areas of the substrate to form deep trench capacitors, wherein the deep trench capacitors each have at least one dimension near a resolution limit of the photoexposure tool; and

processing the substrate in the second regions defined by said openings and said second openings.