Method and apparatus for purging the back side of a substrate during chemical vapor processing
First Claim
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1. A purge gas injector for a processing system that includes a process chamber, the purge gas injector comprising:
- an injector body having a central axis and including an internal conduit and an exit orifice in fluid communication with the internal conduit, said exit orifice distributed around the circumference of the body and oriented to flow the purge gas supplied through the central conduit outward from the body in a range of substantially radial directions relative to the central axis.
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Abstract
An apparatus for purging the backside of a substrate in a process chamber includes a purge gas injector. The injector includes a substantially annular-shaped opening providing a slit that is structured and arranged to direct a flow of purge gas about radially outward therefrom in a direction approximately parallel to a plane defined by the substrate, wherein the substrate is supported in the process chamber above the purge gas injector. When the substrate is rotated at a sufficient speed, the purge gas flowing from the injector is impelled to flow spirally outward along the backside of the substrate.
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Citations
24 Claims
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1. A purge gas injector for a processing system that includes a process chamber, the purge gas injector comprising:
an injector body having a central axis and including an internal conduit and an exit orifice in fluid communication with the internal conduit, said exit orifice distributed around the circumference of the body and oriented to flow the purge gas supplied through the central conduit outward from the body in a range of substantially radial directions relative to the central axis. - View Dependent Claims (2, 3, 4, 5)
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6. A processing system comprising:
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a process chamber; a support assembly within said process chamber which supports a substrate during processing; and a purge gas injector positioned below a backside of said substrate when the substrate is supported by said support assembly, said purge gas injector including an injector body having a central axis and including an internal conduit and an exit orifice in fluid communication with internal conduit, said exit orifice distributed around the circumference of the body and oriented to flow a purge gas supplied through the central conduit outward from the body into the process chamber in a range of substantially radial directions relative to the central axis. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method for processing a substrate, comprising:
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supporting a substrate within a process chamber such that a backside of the substrate is substantially exposed; and from a location that is adjacent the backside of the substrate, injecting a purge gas into the process chamber over a range of substantially radial outward directions relative to an axis that is substantially perpendicular to the backside of the substrate. - View Dependent Claims (19, 20, 21, 22, 23, 24)
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Specification