Plasma deposited substrate structure

• US 5,962,138 A
• Filed: 11/24/1997
• Issued: 10/05/1999
• Est. Priority Date: 12/19/1995
• Status: Expired due to Fees

• Current Assignee: Talison Research
• Original Assignee: Talison Research
• Inventors: Kolluri, Omprakash S., Johanson, Robert G.
• Primary Examiner(s): ZIRKER, DANIEL R
• Application Number:
  US08/976,827
• Time in Patent Office: 680 Days
• Field of Search: 428/407, 428/411.1, 428/423.5, 428/474.4, 428/480, 204/165, 204/168, 204/169, 427/488
• US Class Current: 428/411.1
• CPC Class Codes: B05D 1/36 Successively applying liquids or other fluent materials, e.g. without intermediate treatment
• CPC Class Codes: B05D 1/62 Plasma-deposition of organic layers plasma deposition in general C23C14/00, C23C16/00
• CPC Class Codes: B05D 7/54 No clear coat specified
• CPC Class Codes: C08F 8/00 Chemical modification by after-treatment graft polymers, block polymers, crosslinking with unsaturated monomers or with polymers C08F251/00 - C08F299/00; of conjugated diene rubbers C08C
• CPC Class Codes: H05B 6/46 Dielectric heating H05B6/64 takes precedence
• CPC Class Codes: Y10T 428/2998 including synthetic resin or polymer
• CPC Class Codes: Y10T 428/31504 Composite [nonstructural laminate]
• CPC Class Codes: Y10T 428/31562 Next to polyamide [nylon, etc.]
• CPC Class Codes: Y10T 428/31725 Of polyamide

Abstract

A substrate structure having three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-imensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks provides means for significantly increasing the surface functional density.

Claims

1. A substrate structure, comprising:

a substrate having a surface thereon; and

a plurality of radio frequency discharge plasma film layers said film layers being sequentially deposited on said substrate surface, said plasma film layers including a first layer and a second layer at least partially covalently bonded to said first layer;

said second layer having a substantially ordered geometric structure, said structure including a plurality of substantially uniformly dispersed interstitial spaces;

said first layer including a plurality of a first functional group;

said second layer including a plurality of a second functional group.

2. The substrate structure according to claim 1 wherein, said first functional group comprises an amine functional group.

3. The substrate structure according to claim 1 wherein, said second functional group is selected from the group consisting of carboxy, carboxylic ester, epoxy, isocyanate, hydroxy and sulfhydryl.

4. The substrate structure according to claim 1 wherein, said first functional group is selected from the group consisting of carboxy, carboxylic ester, epoxy, amine, isocyanate, hydroxy and sulfhydryl.

5. The substrate structure according to claim 1 wherein, said second functional group is selected from the group consisting of carboxy, carboxylic ester, epoxy, amine, isocyanate, hydroxy and sulfhydryl.

6. The substrate structure according to claim 5 wherein, said second functional group is reactive with said first functional group.

7. The substrate structure according to claim 1 wherein, said geometric structure comprises a dual branched spatial configuration.

8. The substrate structure according to claim 1 wherein, said geometric structure comprises a triple branched spatial configuration.

9. The substrate structure according to claim 1 wherein, said geometric structure comprises a quadruple branched spatial configuration.

10. The substrate structure according to claim 1 wherein, said geometric structure comprises a heterocyclic ring spatial configuration.

11. The substrate structure according to claim 1 wherein, said geometric structure comprises a linear chain spatial configuration.