High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balanced
First Claim
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1. A process for fabricating a product comprising the steps of:
- (1) generating a gaseous discharge using an inductive coupling structure which couples phase and anti-phase capacitive currents to the gaseous discharge;
(2) subjecting a substrate to entities, at least one of which emanates from a species generated by the gaseous discharge excited by a high frequency field; and
(3) substantially balancing the phase and anti-phase capacitive currents.
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Abstract
A process for fabricating a product including the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a plasma excited by a high frequency field provided by an inductive coupling structure in which the phase and anti-phase capacitive currents into the plasma are substantially balanced.
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Citations
20 Claims
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1. A process for fabricating a product comprising the steps of:
- (1) generating a gaseous discharge using an inductive coupling structure which couples phase and anti-phase capacitive currents to the gaseous discharge;
(2) subjecting a substrate to entities, at least one of which emanates from a species generated by the gaseous discharge excited by a high frequency field; and
(3) substantially balancing the phase and anti-phase capacitive currents. - View Dependent Claims (2, 3, 4, 5, 6)
- (1) generating a gaseous discharge using an inductive coupling structure which couples phase and anti-phase capacitive currents to the gaseous discharge;
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7. A process for fabricating a product comprising the steps of:
- (1) generating a plasma using a helical resonator having a coil having elements and a surrounding shield having a surrounding shield potential;
(2) capacitively coupling plasma to certain elements of the coil which have a potential greater than the surrounding shield potential, thereby driving a first current, and capacitively coupling plasma to other elements of the coil which have a potential below the surrounding shield potential, thereby driving a second current; and
(3) subjecting a substrate to a composition of entities and employing the resulting substrate for completion of the product, at least one of the entities emanating from a species generated by the plasma, the integral of the first current being substantially equal to the integral of the second current. - View Dependent Claims (8, 9)
- (1) generating a plasma using a helical resonator having a coil having elements and a surrounding shield having a surrounding shield potential;
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10. Apparatus for fabricating a product, the apparatus comprising:
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an enclosure comprising an outer surface and an inner surface, the enclosure housing a gaseous discharge; an inductive coupling structure disposed adjacent to the outer surface; a high frequency power source operably coupled to the inductive coupling structure, the high frequency power source and inductive coupling structure being adapted to excite the gaseous discharge in a manner to provide at least one entity from a high frequency field in which the vector sum of phase and anti-phase capacitive current coupled from the inductive coupling structure substantially balances. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification