Method of controlling exposure
First Claim
1. A method of controlling exposure in which an object on a stage is exposed to light with a desired exposure quantity, said method comprising the steps of:
- selecting an aperture size of an aperture stop which can vary said aperture size;
detecting a part of light passed through said aperture stop by a photodetector;
calibrating an output of said photodetector based on the aperture size of said aperture stop;
detecting a part of light on said stage by an illuminance meter; and
storing a correlation function between an output of said photodetector and an output of said illuminance meter corresponding to each aperture size of said aperture stop, wherein said correlation function is;
space="preserve" listing-type="equation">I=α
(I)Ewherein I is the output of said photodetector, α
(I) is a high-order function which corresponds to the aperture size and depends on the output I, and E is the output of said illuminance meter.
1 Assignment
0 Petitions
Accused Products
Abstract
The exposure quantity with respect to a wafer is correctly measured under each illumination condition even when illumination conditions are changed over. Under each of conditions where the σ value (coherence factor) of an illumination optical system is set to various values including its small, standard, and large values, a correlation data between the output (E) of a reference illuminance meter and the output (I) of an integrator sensor is obtained. With respect to the correlation data for the respective σ values, approximate lines (24A, 24B, 24C, etc) are determined by the method of least squares and then gradients of these lines are stored as correlation coefficients (α). Under the illumination condition corresponding to each σ value, the output (I) of the integrator sensor is divided by its corresponding correlation coefficient (α) so as to compute the exposure energy on the image surface.
-
Citations
30 Claims
-
1. A method of controlling exposure in which an object on a stage is exposed to light with a desired exposure quantity, said method comprising the steps of:
-
selecting an aperture size of an aperture stop which can vary said aperture size; detecting a part of light passed through said aperture stop by a photodetector; calibrating an output of said photodetector based on the aperture size of said aperture stop; detecting a part of light on said stage by an illuminance meter; and storing a correlation function between an output of said photodetector and an output of said illuminance meter corresponding to each aperture size of said aperture stop, wherein said correlation function is;
space="preserve" listing-type="equation">I=α
(I)Ewherein I is the output of said photodetector, α
(I) is a high-order function which corresponds to the aperture size and depends on the output I, and E is the output of said illuminance meter. - View Dependent Claims (2, 3, 4)
-
-
5. A method of illuminating with exposure illumination light under which the pattern of a mask is transferred onto a photosensitive substrate, said method comprising:
-
receiving a luminous flux separated from said illumination light and outputting a signal of the luminous flux; calculating an exposure quantity of said illumination light on said substrate based on said signal of the luminous flux; and storing correlation values for computing the exposure quantity on said substrate from said signal, said correlation values corresponding to each of a plurality of illumination conditions in said exposure illumination light, wherein a correlation function is;
space="preserve" listing-type="equation">I=α
(I)Ewherein I is said signal of the luminous flux, α
(I) is a high-order function which corresponds to the illumination condition, and E is an exposure energy on said photosensitive substrate. - View Dependent Claims (6, 7)
-
-
8. A method of illuminating with exposure illumination light under which the pattern of said mask is transferred onto a photosensitive substrate, said method comprising:
-
receiving a luminous flux separated from said illumination light and outputting a signal of the luminous flux; calculating an exposure quantity of said illumination light on said substrate based on said signal of the luminous flux; and storing correlation coefficients or correlation maps for computing the exposure quantity on said substrate from said signal, said correlation coefficients or correlation maps corresponding to each of a plurality of illumination conditions in said exposure illumination light, wherein a correlation function is;
space="preserve" listing-type="equation">I=α
(I)Ewherein I is said signal of the luminous flux, α
(I) is a high-order function which corresponds to the illumination condition, and E is an exposure energy on said photosensitive substrate. - View Dependent Claims (9, 10)
-
-
11. An exposure method for exposing a substrate by illuminating a pattern of a mask with exposure light and projecting an image of said pattern onto said substrate via a projection optical system, said method comprising the steps of:
-
using a reference photodetector among a plurality of exposure apparatuses to detect energy of said exposure light on an image surface side of said projection optical system under a plurality of illumination conditions; and determining exposure quantity control data corresponding to said plurality of illumination conditions respectively on the basis of a result of detection by said reference photodetector. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
-
-
22. An exposure method for exposing a substrate by illuminating a pattern of a mask with exposure light and projecting an image of said pattern onto said substrate via a projection optical system, said method comprising the steps of:
-
obtaining first exposure quantity control data by using a reference illuminance meter to detect energy of said exposure light on an image surface side of said projection optical system under a first illumination condition; obtaining a first signal outputted from a photodetector disposed on a stage for holding said substrate when energy of said exposure light is detected by said photodetector under the first illumination condition; obtaining a second signal outputted from said photodetector when the energy of said exposure light is detected by said photodetector under a second illumination condition differing from the first illumination condition; and obtaining second exposure quantity control data under the second illumination condition on the basis of said first exposure quantity control data, said first signal and said second signal. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30)
-
Specification