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Semiconductor thermal conditioning apparatus and method

  • US 5,966,940 A
  • Filed: 11/18/1997
  • Issued: 10/19/1999
  • Est. Priority Date: 11/18/1997
  • Status: Expired due to Fees
First Claim
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1. An apparatus for thermal conditioning of a semiconductor unit comprising:

  • a surface plate for receiving the semiconductor unit thereon;

    at least one temperature sensor for sensing the temperature of the surface plate;

    a thermoelectric device having first and second sides with the first side disposed against the surface plate;

    a closed loop heat exchanger coupled to the second side of the thermoelectric device including;

    a chamber having an inlet and an outlet, the chamber disposed to and in connection with the second side of the thermoelectric device, conduit connected to the inlet and outlet of the chamber, a heat transfer unit connected to the conduit opposite the chamber, a heat transfer fluid contained within the chamber, conduit and heat transfer unit, and a pump connected to the conduit for pumping the heat transfer fluid through the closed loop heat exchanger, wherein the heat transfer unit transfers heat to or from the heat transfer fluid to control the temperature of the heat transfer fluid,wherein the thermoelectric device transfers heat to or from the surface plate to thermally condition the semiconductor device disposed on the surface plate and the closed loop heat exchanger transfers heat to or from the second side of the thermoelectric device to increase the range of temperature under which the semiconductor unit may be thermally conditioned by the surface plate.

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