Treatment method in glow-discharge plasma and apparatus thereof

• US 5,968,377 A
• Filed: 05/22/1997
• Issued: 10/19/1999
• Est. Priority Date: 05/24/1996
• Status: Expired due to Term

• Current Assignee: Sekisui Chemical Company Limited (Sekisui)
• Original Assignee: Sekisui Chemical Company Limited (Sekisui)
• Inventors: Yara, Takuya, Yuasa, Motokazu
• Primary Examiner(s): PASCHALL, MARK H
• Application Number:
  US08/861,689
• Time in Patent Office: 880 Days
• Field of Search: 219/121.43, 219/121.44, 219/121.54, 219/121.4, 219/121.52, 219/121.59, 219/121.41, 118/723 FE, 118/723 R, 204/192.12, 204/298.08
• US Class Current: 219/121.41
• CPC Class Codes: H01J 37/32018 Glow discharge
• CPC Class Codes: H01J 37/32027 DC powered
• CPC Class Codes: H01J 37/32045 Circuits specially adapted for controlling the glow discharge
• CPC Class Codes: H01J 37/32825 Working under atmospheric pressure or higher

Abstract

In a glow-discharge plasma treatment, a substrate is disposed between two opposing electrodes, at least one electrode being covered by a solid dielectric at an opposing surface. An electric field is imposed between the electrodes in an atmospheric pressure. The electric field is pulse modulated such that an onset time, prefeably an offset time as well, of a pulse is less than 100 μs, and field intensity is 1 to 100 kV/cm. Thus, a stable and evenly dispersed discharge-plasma is obtained, which can treat an outer to surface of the substrate.

Claims

1. A method of glow-discharge plasma treatment, comprising:

placing a substrate between two opposing electrodes, at least one of opposing surfaces of the opposing electrodes being covered with a solid dielectric; and

imposing an electric field between the opposing electrodes around an atmospheric pressure, the electric field being pulse modulated in a manner such that an onset time of a pulse of the electric field is less than 100 μ

s and field intensity is 1 to 100 kV/cm.

2. A method of claim 1, wherein the electric field is pulse modulated to a frequency of 0.5 to 100 kHz and has a pulse duration of 1 to 1000 microseconds in a cycle.

3. A method of claim 1, wherein the electric field is pulse modulated in a high voltage pulse power unit, which comprises a high voltage direct current source and a pulse controller converting a high voltage direct current to high voltage pulses by means of semiconductor elements having a turning-on time or a turning-off time of less than 500 nanoseconds.

4. A method of claim 1, wherein the glow-discharge plasma is generated in a gas atmosphere, at least 10% of the gas having a molecular weight of 10 or higher.

5. A method of claim 1, wherein the plasma is generated in a gas atmosphere containing at least one of argon and nitrogen.

6. A method of claim 1, wherein the plasma is generated in a gas atmosphere containing a compound having a metal element.

7. A method of claim 1, wherein the imposed electric field is pulse modulated and energized to generate a discharge current density of 0.2 to 300 mA/cm² between the electrodes.

8. A method of claim 1, wherein the solid dielectric has a dielectric constant of 10 or higher at 25°

C. and said electrodes are flat parallel plates without holes.

9. A method of claim 1, wherein the solid dielectric is a metal oxide compound containing 5 to 50 wt % titanium oxide and 50 to 95 wt % aluminum oxide.

10. A method of claim 1, wherein the solid dielectric is a metal oxide compound containing zirconium oxide.

18. A method of claim 4, wherein the solid dielectric has a dielectric constant of 10 or higher at 25°

C. and said electrodes are flat parallel plates without holes.

11. A method of glow-discharge plasma treatment, comprising:

providing two opposing electrodes in a closed treating chamber, at least one of opposing surfaces of the opposing electrodes being covered with a solid dielectric, said closed treating chamber having an entrance and an exit for feeding a substrate, which allow a gas to leak therethrough;

continuously feeding the substrate through the entrance of the treating chamber, guiding the substrate between the two electrodes and hauling the substrate through the exit of the treating chamber;

supplying a treating gas in the treating chamber to contact the substrate, said treating gas flowing in a direction opposite to a moving direction of the substrate; and

imposing an electric field between the opposing electrodes while the substrate is passing therebetween, said electric field being pulse modulated in a manner such that an onset time of a pulse of the electric field is less than 100 μ

s and field intensity is 1 to 100 kV/cm.

12. A method of glow-discharge plasma treatment, comprising:

providing a gas reservoir made of a solid dielectric and having a gas outlet opening, one electrode mounted on the reservoir, and the other electrode away from the one electrode;

placing a substrate between the gas outlet opening and the other electrode;

ejecting a treating gas continuously from the gas outlet opening; and

imposing an electric field between the one and the other electrodes, said electric field being pulse modulated in a manner such that an onset time of a pulse of the electric field is less than 100 μ

s and field intensity is 1 to 100 kV/cm.

13. A method of glow-discharge plasma treatment, comprising:

placing a substrate in a space formed by two opposing electrodes and surrounding walls made of a dielectric, said space being filled with a treating gas; and

exposing the substrate to plasma generated by an electric field imposed between the electrodes around an atmospheric pressure, said electric field being pulse modulated in a manner such that an onset time of a pulse of the electric field is less than 100 μ

s and field intensity is 1 to 100 kV/cm.

14. An apparatus for glow-discharge plasma treatment comprising:

two opposing electrodes;

a solid dielectric disposed on a surface of at least one of the electrodes; and

a high voltage pulse power unit generating a pulse modulated electric field, said pulse modulated electric field having an onset time of a pulse less than 100 μ

s, said power unit including a high voltage direct current source and a pulse controller converting a high voltage direct current to high voltage pulses by means of semiconductor elements having a turning-on time and a turning-off time of less than 500 nanoseconds.

15. An apparatus for glow-discharge plasma treatment, comprising:

a closed treating chamber having an entrance and an exit adapted to continuously transfer a substrate from the entrance to the exit;

two opposing electrodes located in the chamber, at least one of the opposing electrodes having a solid dielectric on a surface opposing the other of the opposing electrodes;

a gas spout formed in the treating chamber adapted to eject a treating gas on the substrate in a direction opposite to a moving direction of the substrate; and

a high voltage pulse power unit electrically connected to the electrodes to impose a pulse modulated electric field between the opposing electrodes, the electric field having an onset time of a pulse less than 100 μ

s and field intensity of 1 to 100 kV/cm.

16. An apparatus of claim 15, in which said high voltage power unit comprises a high voltage direct current source, and a pulse controller converting high voltage direct current to high voltage pulses by means of semiconductor elements having a turning-on time and/or a turning-off time of less than 500 nanoseconds.

17. An apparatus of claim 16, in which said pulse controller provides a discharge stopping time between the high voltage pulses in one cycle, said discharge stopping time being formed at least once in 1 ms.

19. An apparatus for glow-discharge plasma treatment, comprising:

a gas reservoir made of a solid dielectric, said gas reservoir having a gas outlet opening adapted to eject a treating gas continuously, one electrode mounted near the gas outlet opening and the other electrode mounted opposite to the gas outlet opening; and

a high voltage pulse power unit connected to the one and the other electrodes to impose a pulse modulated electric field between the two electrodes, said electric field having an onset time of a pulse less than 100 μ

s and field intensity of 1 to 100 kV/cm.

20. An apparatus for glow-discharge plasma treatment, comprising:

a pair of horizontally installed electrodes and vertically installed walls made of a solid dielectric for surrounding the electrodes to thereby form a treating space;

inlet and outlet pipes connected to the treating space, said inlet pipe introducing a treating gas and the outlet pipe ventilating the gas in the treating space; and

a high voltage pulse power unit connected to the electrodes to impose a pulse modulated electric field between the two electrodes, the electric field having an onset time of a pulse less than 100 μ

s, and field intensity of 1 to 100 kV/cm.