Method and apparatus for critical dimension and tool resolution determination using edge width

• US 5,969,273 A
• Filed: 02/12/1998
• Issued: 10/19/1999
• Est. Priority Date: 02/12/1998
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Lagus, Mark E., Swing, legal representative, by Jeffrey, Solecky, Eric P., Archie, Charles N., Wheeler, Donald C., Nyyssonen, deceased, Diana
• Primary Examiner(s): NOORI, MAX H
• Application Number:
  US09/023,059
• Time in Patent Office: 614 Days
• Field of Search: 73/865.8, 73/104, 73/105, 356/355, 356/358, 11/356
• US Class Current: 73/865.8
• CPC Class Codes: G01B 15/00 Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons characterised by the use of optical techniques G01B9/00, G01B11/00
• CPC Class Codes: G01Q 40/00 Calibration, e.g. of probes

Abstract

A method for monitoring a process in which a feature is formed on a substrate. A plurality of dimensions of the feature are measured using a tool. An edge width of the feature is calculated based on the plurality of dimensions. The edge width is used to determine whether the process is operating within a desired specification. The calculated edge width is compared to a baseline edge width measurement to determine a difference between them. The process is determined to be operating within the specification if the difference is less than a threshold value. If the difference is greater than or equal to the threshold value, the method determines whether the difference is caused by a change in resolution of the tool. A plurality of diagnostic measurements of the edge width may be performed. The tool is adjusted to have a respectively different focus for each respective one of the plurality of diagnostic measurements. The method includes determining that the difference between the calculated edge width and the baseline edge width is caused by a change in resolution of the tool if any one of the plurality of diagnostic measurements of the edge width differs from the baseline edge width by less than the threshold value. The method also includes determining that the process is not operating within the specification, if the difference is greater than or equal to the threshold value, and the difference is not caused by a change in resolution of the tool.

Claims

1. A method for monitoring a process in which a feature is formed on a substrate, comprising the steps of:

(a) measuring a plurality of dimensions of the feature using a tool;

(b) calculating an edge width of the feature based on the plurality of dimensions; and

(c) determining whether the process is operating within a desired specification based on the edge width by;

(c1) comparing the calculated edge width to a baseline edge width measurement to determine a difference therebetween,

(c2) determining that the process is operating within the specification if the difference is less than a threshold value,

(c3) determining whether the difference is caused by a change in resolution of the tool, if the difference is greater than or equal to the threshold value, and

(c4) determining that the process is not operating within the specification, if the difference is greater than or equal to the threshold value, and the difference is not caused by a change in resolution of the tool.

3. A method according to claim 1, wherein step (c3) includes:

(c3A) performing a plurality of diagnostic measurements of the edge width,

(c3B) adjusting the tool to have a respectively different focus for each respective one of the plurality of diagnostic measurements,

(c3C) identifying whether any of the plurality of diagnostic measurements of the edge within in step (c3A) differs from the baseline edge width by less than the threshold value, and

(c3D) determining that the difference between the calculated edge width and the baseline edge width is caused by a change in resolution of the tool if anyone of the plurality of diagnostic measurements of the edge width in step (c3A) differs from the baseline edge width by less than the threshold value.

6. A method according to claim 1, wherein the tool is a scanning electron microscope.

7. A method according to claim 6, wherein step (a) includes measuring a first width of the feature at a bottom surface of the feature and a second width of the feature at a top surface of the feature.

8. A method according to claim 7, wherein step (b) includes calculating the edge width based on the difference between the first width and the second width.

9. A method according to claim 8, wherein step (a) includes:

(a1) measuring an amplitude of a waveform generated by the scanning electron microscope,

(a2) identifying a respective point on each side of the feature as the top of a respective edge, such that the waveform has a maximum amplitude at each of the points identified as the top of one of the edges, and

(a3) calculating the second width as a distance between the respective points identified in step (a2).

10. A method according to claim 8, wherein step (a) further includes:

(a4) calculating the derivative of the amplitude at a plurality of points proximate to each point identified as the top of one of the edges,

(a5) identifying a respective point on each side of the feature as the bottom of a respective edge, such that the absolute value of the derivative of the amplitude begins to decrease from a maximum value at each point identified as the bottom of one of the edges, and

(a6) calculating the first width as a distance between the respective points identified in step (a5).

17. A method according to claim 1, wherein the tool is an atomic force microscope.

2. Apparatus for monitoring a process in which a feature is formed on a substrate, comprising:

means for receiving a plurality of measurements of the feature that are collected by a tool;

means for calculating an edge width of the feature based on the plurality of dimensions; and

means for determining whether the process is operating within a desired specification based on the edge width and having;

(a) means for comparing the calculated edge width to a baseline edge width measurement to determine a difference therebetween,

(b) means for determining that the process is operating within the specification if the difference is less than a threshold value,

(c) diagnostic means for determining whether the difference is caused by a change in resolution of the tool, if the difference is greater than or equal to the threshold value, and

(d) means for determining that the process is not operating within the specification, if the difference is greater than or equal to the threshold value, and the difference is not caused by a change in resolution of the tool.

18. Apparatus according to claim 2, wherein the diagnostic means includes:

(a) means for performing a plurality of diagnostic measurements of the edge width,

(b) means for adjusting the tool to have a respectively different focus for each respective one of the plurality of diagnostic measurements,

(c) means for identifying whether any of the plurality of diagnostic measurements of the edge width differs from the baseline edge width by less than the threshold value, and

(d) means for determining that the difference between the calculated edge width and the baseline edge width is caused by a change in resolution of the tool if any one of the plurality of diagnostic measurements of the edge width differs from the baseline edge width by less than the threshold value.

4. A method for monitoring a process in which a feature is formed on a substrate, comprising the steps of:

(a) measuring a plurality of dimensions of the feature using a tool;

(b) calculating an edge width of the feature based on the plurality of dimensions;

(c) determining whether the process is operating within a desired specification based on the edge width;

(d) determining whether the resolution of the tool has changed from a baseline resolution, based on the edge width; and

(e) automatically adjusting the resolution of the tool without operator intervention if resolution of the tool has changed from the baseline resolution.

5. A method according to claim 4, wherein step (e) includes:

A method according to claim 4, wherein step (e) includes;

(e1) performing a plurality of diagnostic measurements of the edge width,

(e2) adjusting the tool to have a respectively different resolution for each of the plurality of diagnostic measurements,

(e3) identifying which of the plurality of diagnostic measurements of the edge width in step (e1) differs from the baseline edge width by a smallest amount, and

(e4) adjusting the resolution of the tool to a setting which produces the smallest amount of difference in step (e3).

11. A method for monitoring a process in which a feature is formed on a substrate, comprising the steps of

(a) measuring the feature using a scanning electron microscope, and generating from the measurement a waveform having an amplitude;

(b) identifying a respective top point on each side of the feature based on the amplitude of the waveform, each top point being the top of a respective edge;

(c) identifying a first inner point, the first inner point being a point closest to a center of the feature, at which the waveform has a maximum negative slope among the points between the two top points, and

(d) identifying a second inner point, the second inner point being a point closest to a center of the feature, at which the waveform has a maximum positive slope among the points between the two top points;

(e) identifying a respective bottom point on each side of the feature based on the amplitude of the waveform, each bottom point being the bottom of a respective edge;

(f) calculating a first distance between the bottoms of the edges and a second distance between the first and second inner points; and

(g) determining whether the process is operating within a desired specification based on the first and second distances.

12. A method according to claim 11, wherein the tops of the edges are located between the bottoms of the edges, and the absolute value of the derivative of the amplitude begins to decrease from a maximum value at each point identified as the bottom of one of the edges.

13. A method according to claim 12, wherein the waveform has a maximum amplitude at each of the points identified as the top of one of the edges.

14. A method according to claim 11, wherein step (g) includes determining whether the process is operating within a desired specification based on the difference between the first distance and the second distance.

15. A method of monitoring a process in which a feature is formed on a substrate, comprising the steps of:

(a) measuring a plurality of dimensions of the feature using a tool;

(b) calculating a humpwidth of the feature based on the plurality of dimensions; and

(c) determining whether the process is operating within a desired specification based on the humpwidth by;

(c1) comparing the calculated edge width to a baseline edge width measurement to determine a difference therebetween,

(c2) determining that the process is operating within the specification if the difference is less than a threshold value,

(c3) determining whether the difference is caused by a change in resolution of the tool, if the difference is greater than or equal to the threshold value, and

(c4) determining that the process is not operating within the specification, if the difference is greater than or equal to the threshold value, and the difference is not caused by a change in resolution of the tool.

19. A method according to claim 15, wherein step (c3) includes:

(c3A) performing a calibration of the atomic force microscope,

(c3B) performing a new edge width measurement after the calibration, and

(c3C) determining that the difference is caused by a change in resolution of the tool, if the difference between the new edge width measurement and the baseline edge width measurement is less than the threshold value.

16. A method for monitoring a process in which a feature is formed on a substrate, comprising the steps of

(a) measuring the feature using a scanning electron microscope, and generating from the measurement a waveform having an amplitude;

(b) identifying a respective point on each side of the feature as the top of a respective edge;

(c) calculating the derivative of the amplitude at a plurality of points located between the points identified as the tops of the edges in step (b);

(d) identifying a respective inner point on each side of the feature, such that the inner points are located between the points identified as the tops of the edges in step (b), and the absolute value of the derivative of the amplitude begins to decrease from a maximum value at each inner point;

(e) identifying a respective point on each side of the feature as the bottom of a respective edge;

(f) calculating a first distance between the bottoms of the edges and a second distance between the inner points; and

(g) determining whether the process is operating within a desired specification based on the first and second distances.