Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device

• US 5,969,441 A
• Filed: 10/10/1997
• Issued: 10/19/1999
• Est. Priority Date: 12/24/1996
• Status: Expired due to Term

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASM Lithography Incorporated (ASML Holding NV)
• Inventors: Veldhuis, Gerjan P., Van Der Schoot, Harmen K., Bonnema, Gerrit M., Ter Beek, Paulus M. H., Loopstra, Erik R.
• Primary Examiner(s): Dougherty, Thomas M.
• Assistant Examiner(s): JONES, JUDSON
• Application Number:
  US08/948,471
• Time in Patent Office: 739 Days
• Field of Search: 310/12, 310/51, 318/135, 74/479.01, 74/480 R, 108/137, 108/143, 248/178.1
• US Class Current: 310/12.06
• CPC Class Codes: B23Q 1/621 a single sliding pair followed perpendicularly by a single sliding pair
• CPC Class Codes: B23Q 1/623 followed perpendicularly by a single rotating pair
• CPC Class Codes: B23Q 11/0032 Arrangements for preventing or isolating vibrations in parts of the machine B23B29/022, B23D47/005 take precedence; means for damping or suppressing vibrations, in general F16F
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries
• CPC Class Codes: G03F 7/7075 Handling workpieces outside exposure position, e.g. SMIF box
• CPC Class Codes: G03F 7/70766 Reaction force control means, e.g. countermass
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation
• CPC Class Codes: H01L 21/682 Mask-wafer alignment in general G03F7/70, G03F9/70
• CPC Class Codes: Y10T 74/20213 Interconnected

Abstract

Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device.

A positioning device (3, 97, 179) with a first displacement unit (25, 189) for displacing a first object holder (11, 181) and a second displacement unit (27, 191) for displacing a second object holder (13, 183). The object holders can be displaced by the positioning device alternately from a measuring position into an operational position and can be displaced by the respective displacement units independently of one another in the measuring position and in the operational position.

The displacement units are provided with force actuators which each have a first part (47, 49; 117, 119; 215, 217) which is coupled to the relevant object holder and which is displaceable under the influence of a driving force relative to a second part (59, 61; 133, 135, 137, 139; 219, 221) which is fastened to a balancing unit (69, 149, 205) which is common to the two displacement units. The balancing unit is displaceably guided relative to a base (81, 209), so that reaction forces of the displacement units are converted into displacements of the balancing unit relative to the base, and mechanical vibrations in the balancing unit and the base are prevented. The use of the force actuators prevents the displacements of the balancing unit from disturbing the positions of the object holders relative to the base.

The positioning device is further provided with a control unit (83, 169, 237) by means of which at least the parts (47, 49; 121, 123; 219, 221) directed parallel to an X-direction of the X-actuators (39, 41; 105, 107; 211, 213) coupled to the object holders are held in positions parallel to the X-direction. It is also prevented in this manner that positions of the object holders relative to the base are interfered with by rotations of the balancing unit caused by the reaction forces of the displacement units.

The positioning device can be used in a lithographic device for the displacement of a semiconductor substrate relative to an exposure system of the lithographic device and for the displacement of a mask relative to the exposure system.

Claims

1. A positioning device provided with a base, a first displacement unit with a first object holder which is displaceable relative to the base parallel to an X-direction and parallel to a Y-direction which is perpendicular to the X-direction, and a second displacement unit with a second object holder which is displaceable relative to the base parallel to the X-direction and parallel to the Y-direction, said first and second object holders being displaceable relative to the base consecutively from a measuring position into an operational position, while the first and the second displacement unit each comprise a first part and a second part which are displaceable relative to one another and which exert a driving force on one another during operation, the first parts of the first and the second displacement unit being coupled to the first object holder and to the second object holder, respectively, seen parallel to the X-direction and parallel to the Y-direction, characterized in that the second parts of the first and the second displacement unit, seen parallel to the X-direction and parallel to the Y-direction, are coupled to a balancing unit which is common to the first and the second displacement unit and which is displaceably guided relative to the base parallel to the X-direction and parallel to the Y-direction, while the first and the second displacement unit each comprise a force actuator for generating the driving force.

2. A positioning device as claimed in claim 1, characterized in that the force actuators of the first and the second displacement units generate exclusively Lorentz forces.

3. A positioning device as claimed in claim 1, characterized in that the balancing unit is displaceably guided by means of a static gas bearing over a guiding surface of the base which extends parallel to the X-direction and parallel to the Y-direction.

4. A positioning device as claimed in claim 1, characterized in that the two displacement units are each provided with an X-actuator and a Y-actuator, said X-actuators being each provided with a first part which, seen parallel to the X-direction and parallel to the Y-direction, is coupled to the object holder of the relevant displacement unit and, seen parallel to the X-direction, is displaceable relative to a second part of the relevant X-actuator, while the Y-actuators are each provided with a first part which is fastened to the second part of the X-actuator of the relevant displacement unit and which, seen parallel to the Y-direction, is displaceable relative to a second part of the relevant Y-actuator which is fastened to the balancing unit.

5. A positioning device as claimed in claim 4, characterized in that the positioning device is provided with a control unit for controlling at least one actuator by means of which at least the second parts of the X-actuators of the two displacement units are retainable in a position parallel to the X-direction.

6. A positioning device as claimed in claim 4, characterized in that the Y-actuators of the displacement units are provided with a common straight guide along which the first parts of the Y-actuators are displaceably guided, while the positioning device is provided with a rotatable unit having a first part which is fastened to the balancing unit and a second part which is rotatable relative to the first part about an axis of rotation extending perpendicularly to the X-direction and perpendicularly to the Y-direction and which is fastened to the common straight guide.

7. A positioning device as claimed in claim 5, characterized in that the control unit controls the rotatable unit.

8. A positioning device as claimed in claim 4, characterized in that the balancing unit comprises a support body which is provided with a guiding surface which extends parallel to the X-direction and parallel to the Y-direction, which is common to the two object holders, and along which the two object holders are displaceable parallel to the X-direction and parallel to the Y-direction, said object holders being both provided with a coupling member by means of which the relevant object holder can be coupled in turn to the first part of the X-actuator of the first displacement unit and to the first part of the X-actuator of the second displacement unit.

9. A positioning device as claimed in claim 8, characterized in that the coupling members of the object holders each comprise an XY Lorentz force actuator which is provided with a first part fastened to the relevant object holder and with a second part fastened to the first part of the X-actuator of the relevant displacement unit, the first parts of the XY Lorentz force actuators each being capable of cooperation with the second parts of the two XY Lorentz force actuators.

10. A positioning device as claimed in claim 5, characterized in that the two displacement units are each provided with two Y-actuators which are each provided with a second part which extends parallel to the Y-direction, while the second parts of the X-actuators of the two displacement units are each pivotable relative to the two first parts of the relevant Y-actuators about pivot axes extending perpendicularly to the X-direction and perpendicularly to the Y-direction, the control unit controlling the Y-actuators of both displacement units.

11. A lithographic device provided with a frame to which a radiation source, a mask holder, a focusing unit, and a positioning device are fastened, said focusing unit having a main axis, while the positioning device comprises a substrate holder which is displaceable relative to the focusing unit parallel to an X-direction which is perpendicular to the main axis and parallel to a Y-direction which is perpendicular to the X-direction and perpendicular to the main axis, characterized in that the positioning device used therein is a positioning device as claimed in claim 1, wherein each of the two object holders of the positioning device is a substrate holder of the lithographic device, and the operational position of the substrate holders is a position in which a substrate placeable on a substrate holder can be irradiated by the radiation source via the focusing unit, while the base of the positioning device is fastened to the frame.

12. A lithographic device as claimed in claim 11, characterized in that the lithographic device comprises a further positioning device by means of which the mask holder is displaceable relative to the focusing unit parallel to at least the X-direction.

13. A lithographic device as claimed in claim 12, characterized in that the further position device is a positioning device provided with a base, a first displacement unit with a first object holder which is displaceable relative to the base parallel to an X-direction and parallel to a Y-direction which is perpendicular to the X-direction, and a second displacement unit with a second object holder which is displaceable relative to the base parallel to the X-direction and parallel to the Y-direction, said first and second object holders being displaceable relative to the base consecutively from a measuring position into an operational position, while the first and the second displacement unit each comprise a first part and a second part which are displaceable relative to one another and which exert a driving force on one another during operation, the first parts of the first and the second displacement unit being coupled to the first object holder and to the second object holer, respectively, seen parallel to the X-direction and parallel to the Y-direction, characterized in that the second parts of the first and the second displacement unit, seen parallel to the X-direction and parallel to the Y-direction, are coupled to a balancing unit which is common to the first and the second displacement unit and which is displaceably guided relative to the base parallel to the X-direction and parallel to the Y-direction, while the first and the second displacement unit each comprise a force actuator for generating the driving force, wherein each of the two object holders of the further positioning device is a mask holder of the lithographic device which can be positioned by the further positioning device parallel to the X-direction and parallel to the Y-direction, and wherein the operational position of the mask holders is a position in which a mask placeable on a mask holder can be irradiated by the radiation source, while the base of the further positioning device is fastened to the frame.

14. A lithographic device provided with a frame to which a positioning device, a focusing unit, a further positioning device, and a radiation source are fastened, said focusing unit having a main axis, while the positioning device comprises a substrate holder which is displaceable relative to the focusing unit parallel to an X-direction which is perpendicular to the main axis and parallel to a Y-direction which is perpendicular to the X-direction and to the main axis, and the further positioning device comprises a mask holder which is displaceable relative to the focusing unit parallel to at least the X-direction, characterized in that the further positioning device is a positioning device as claimed in claim 1, wherein each of the two object holders of the further positioning device is a mask holder of the lithographic device which can be positioned by the further positioning device parallel to the X-direction and parallel to the Y-direction, and wherein the operational position of the mask holders is a position in which a mask placeable on a mask holder can be irradiated by the radiation source, while the base of the further positioning device is fastened to the frame.