Method for evaluating HSG silicon film of semiconductor device by atomic force microscopy
First Claim
1. An method for evaluating an HSG silicon film of a semiconductor device comprising the steps of:
- forming the HSG silicon film on a semiconductor substrate;
measuring characteristics of the HSG silicon film using atomic force microscopy (AFM) to express quantitative values; and
comparing the quantitative values to values from a working specification.
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Accused Products
Abstract
An evaluating method of an HSG silicon film using atomic force microscopy (AFM). The characteristics of the HSG silicon film are measured and expressed with quantitative values using AFM. The above values are compared to values written in the working specification, to thereby evaluate the HSG silicon film and control the conditions of forming the HSG silicon film. Also, the capacitor where the HSG silicon film is interposed is formed, and then the capacitance of the capacitor is measured to determine the HSG height of the HSG silicon film for ensuring desired capacitance and conditions of forming the HSG silicon film. Accordingly, the characteristics of the HSG silicon film may be analyzed without damaging the semiconductor substrate and a preferred working specification for forming the HSG silicon film may be realized, to thereby increase the reproducibility of the HSG silicon film. Also, when the conditions of forming the HSG silicon film are determined, it is checked whether the apparatus for forming the HSG silicon film operates normally.
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12 Claims
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1. An method for evaluating an HSG silicon film of a semiconductor device comprising the steps of:
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forming the HSG silicon film on a semiconductor substrate; measuring characteristics of the HSG silicon film using atomic force microscopy (AFM) to express quantitative values; and comparing the quantitative values to values from a working specification. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification