Method for fabricating organic thin film

• US 5,970,381 A
• Filed: 09/05/1997
• Issued: 10/19/1999
• Est. Priority Date: 09/05/1996
• Status: Expired due to Fees

• Current Assignee: Agency of Industrial Science & Technology (Government of Japan), Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.), Motorola Solutions, Inc.
• Original Assignee: National Institute For Advanced Interdisciplinary Research
• Inventors: Nagahara, Larry A., Ohno, Hirotaka, Tokumoto, Hiroshi
• Primary Examiner(s): Bowers, Charles
• Assistant Examiner(s): NGUYEN, THANH T
• Application Number:
  US08/924,697
• Time in Patent Office: 774 Days
• Field of Search: 427/123, 427/126.1, 427/58, 438/758, 438/939, 438/623, 438/622, 438/779, 438/780, 438/99, 438/761, 438/781
• US Class Current: 438/758
• CPC Class Codes: B05D 1/185 applying monomolecular layers B05D1/204 takes precedence
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: Y10S 438/939 Langmuir-blodgett film utilization

Abstract

A method is provided that produces a good, strong organic monomolecular film having its atoms arranged in a three-dimensionally ordered manner by cleaving a III-V group compound semiconductor substrate in film formation molecules or in a solution containing them, in order to cause selective chemisorption which forms a monomolecular film and then deposits another layer of organic molecule film. In this method, the III-V group compound semiconductor substrate is cleaved in a solution containing SH groups dissolved into a solvent in order to form a self-assembled monolayer and is then placed in another solution, where metallic ions are adsorbed to the surface of the film or where the functional groups are converted by chemical treatment. The substrate is then immersed in a solution containing organic molecules that are selectively chemisorbed to the functional groups. This process is sequentially repeated to form good, strong multilayers having a three-dimensionally ordered arrangement while also controlling film thickness.

Claims

1. An organic thin film fabricating method comprising an immersion of a cleaved III-V group compound semiconductor substrate in a solution or a molten liquid containing amphipathic organic molecules with an SH group derivative at their terminal groups, to allow the amphipathic organic molecules to be adsorbed to a cleaved surface in order to form a first organic monomolecular film;

and further comprising an immersion of the substrate in a solution containing metallic ions and then in a solution containing amphipathic molecules with an SH group at one end and a COOH group at the other end, to deposit another layer of organic monomolecular film atop the fist organic monomolecular film.

2. An organic thin film fabricating method according to claim 1 wherein the amphipathic organic molecules forming the first organic monomolecular film are organic molecules with a COOH group at the other end.

3. An organic thin film fabricating method according to claim 1 wherein the amphipathic organic molecules forming the first organic monomolecular film are organic molecules with a PO₃ H₂ group at the other end.

9. An organic thin film fabricating method according to claims 1, 4, 7 or 8 wherein after being cleaved in an atmosphere of inert gas or in the air, a III-V group compound semiconductor substrate is immediately immersed in a solution containing amphipathic organic molecules or a molten liquid obtained by heating a raw material of amphipathic organic molecules.

10. An organic thin film fabricating method according to claims 1, 4, 7 or 8 wherein the III-V group compound semiconductor substrate is cleaved in a solution containing amphipathic organic molecules or a molten liquid obtained by melting a raw liquid of amphipathic organic molecules.

11. An organic thin film fabricating method according to claims 1, 4, 7 or 8 wherein the solution containing amphipathic organic molecules is evacuated.

12. An organic thin film fabricating method according to claim 9 wherein the solution containing amphipathic organic molecules is deaerated by evacuating the vessel.

13. An organic thin film fabricating method according to claim 10 wherein the solution containing amphipathic organic molecules is deaerated by evacuating the vessel.

14. An organic thin film fabricating method according to claims 1, 4, 7 or 8 wherein a desiccating agent is fed in a solvent into which amphipathic organic molecules are dissolved to remove water impurity.

15. An organic thin film fabricating method according to claim 9 wherein a desiccating agent is fed in a solvent into which amphipathic organic molecules are dissolved to remove water impurity.

16. An organic thin film fabricating method according to claim 10 wherein a desiccating agent is fed in a solvent into which amphipathic organic molecules are dissolved to remove water impurity.

17. An organic thin film fabricating method according to claims 1, 4, 7 or 8 wherein a process for accumulating another organic monomolecular film on an initial layer of organic monomolecular film is repeated to sequentially deposit multiple layers of organic film.

18. An organic thin film fabricating method according to claim 9 wherein a process for accumulating another layer of organic monomolecular film on an initial layer of organic monomolecular film is repeated to sequentially deposit multiple layers of organic films.

19. An organic thin film fabricating method according to claim 10 wherein a process for depositing another layer of organic monomolecular film on an initial layer of organic monomolecular film Is repeated to sequentially deposit multiple layers of organic film.

20. An organic thin film fabricating method according to claim 11 wherein a process for depositing another layer of organic monomolecular film on an initial layer of organic monomolecular film is repeated to sequentially deposit multiple layers of organic film.

21. An organic thin film fabricating method according to claim 14 wherein a process for depositing another layer of organic monomolecular film on an initial layer of organic monomolecular film is repeated to sequentially deposit multiple layers of organic film.

22. An organic thin film fabricating method according to claims 12, 13, 15, or 16 wherein a process for depositing another layer of organic monomolecular film on an initial layer of organic monomolecular film is repeated to sequentially deposit multiple layers of organic film.

4. An organic thin film fabricating method comprising an immersion of a cleaved III-V group compound semiconductor substrate in a solution or a molten liquid containing amphipathic organic molecules with an SH group derivative at their terminal groups, to allow the amphipathic organic molecules to be adsorbed to a cleaved surface in order to form a first organic monomolecular film;

and further comprising an immersion of the substrate in a solution containing metallic ions and then in a solution containing amphipathic molecules with a PO₃ H₂ group at both ends, to deposit another layer of organic monomolecular film atop the first organic monomolecular film.

5. An organic thin film fabricating method according to claim 4 wherein the amphipathic organic molecules forming the first organic monomolecular film are organic molecules with a COOH group at the other end.

6. An organic thin film fabricating method according to claim 4 wherein the amphipathic organic molecules forming the first organic monomolecular film are organic molecules with a PO₃ H₂ group at the other end.

7. An organic thin film fabricating method comprising an immersion of a cleaved III-V group compound semiconductor substrate in a solution containing amphipathic organic molecules with an SH group derivative at one end and a COOCH₃ group at the other end, to allow the amphipathic organic molecules to be adsorbed to a cleaved surface in order to form a first organic monomolecular film;

and further comprising an treatment of the substrate with an LiAlH₄ solution dissolved in an organic solvent and with a diluted hydrochloric acid solution, followed by immersion of the substrate in a solution containing amphipathic molecules with a COOCH₃ group at one end and an SiCl₅ group at the other end, in order to deposit another layer of organic monomolecular film atop the first organic monomolecular film.

8. An organic thin film fabricating method comprising an immersion of a cleaved III-V group compound semiconductor substrate in a solution containing amphipathic organic molecules with an SH group derivative at one end and a CH₂ ═

CH group at the other end, to allow the amphipathic organic molecules to be adsorbed to a cleaved surface in order to form a first organic monomolecular film, followed by treatment of the substrate with a B₂ H₆ solution dissolved in an organic solvent and with a mixed solution of sodium hydroxide and hydrogen peroxide in a pure water; and

further comprising an immersion of the substrate in a solution containing amphipathic molecules with a CH₂ ═

CH group at one end and an SiCl₃ group at the other end, to accumulate another layer of organic monomolecular film atop the first organic monomolecular film.