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Heating system for high throughput sputtering

  • US 5,972,184 A
  • Filed: 04/09/1993
  • Issued: 10/26/1999
  • Est. Priority Date: 04/04/1991
  • Status: Expired due to Term
First Claim
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1. A high throughput sputtering apparatus having a plurality of integrally matched components, said components comprising:

  • means for sputtering a multi-layer coating onto a plurality of substrates, said means for sputtering including a series of sputtering chambers each having relative isolation from adjacent chambers to reduce cross contamination between the coating components being sputtered onto substrates therein, said sputtering chambers being isolated from ambient atmospheric conditions;

    means for transporting said plurality of substrates through said means for sputtering at variable velocities;

    means for evacuating said means for sputtering to a vacuum level within a pressure range sufficient to enable sputtering operation;

    means for heating said plurality of substrates to a temperature conducive to sputtering said multi-layer coatings thereon, said means for heating providing a substantially uniform temperature profile over the surface of said substrate, said means for heating comprising a plurality of heating chambers positioned along a substrate transport path wherein a plurality of heating lamps are mounted within the heating chambers, said plurality of heating lamps having rapid heat-up time; and

    control means for providing control signals to, and for receiving feedback input from, said means for sputtering, means for transporting, means for evacuating, and means for heating, said control means being programmable to automatically control said means for sputtering, means for transporting, means for evacuating and means for heating to synchronize said means for sputtering, means for transporting, and means for heating, the control means providing the feedback input to a user interface and being responsive to input from the user interface;

    wherein the control means alters the control signals in real time responsive to the input from the user interface, the control means thereby allowing a system operator to precisely control the multi-layer coating applied to the substrates.

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