Apparatus for use in cleaning wafers
First Claim
1. Apparatus for use in automatically cleaning semiconductor wafers, the apparatus comprising:
- a wafer entry station for receiving multiple wafers held in a vertical orientation;
first wafer transfer means for transferring one wafer at a time from the wafer entry station without changing the vertical orientation of said one wafer;
a spin dryer constructed for receiving said one wafer from said first wafer transfer means and holding said one wafer in a vertical orientation, the spin dryer being rotatable about an axis passing generally through the center of said one wafer received from said first wafer transfer means at a rate of rotation selected to throw liquid on said one wafer off of the wafer;
second wafer transfer means for transferring said one wafer from the spin dryer in a vertical orientation;
a wafer exit station for receiving said one wafer from said second wafer transfer means in a vertical orientation.
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0 Petitions
Accused Products
Abstract
A semiconductor wafer scrubbing and drying apparatus is capable processing wafers in a vertical orientation from start to finish. The apparatus moves the wafers in a generally vertical direction from an entry station of the apparatus to a dryer of the apparatus. The wafers enter the apparatus in a cassette and exit in another cassette in the same order as they were in the entry cassette to preserve individual wafer identity. The apparatus is constructed so that the compartment in which the wafers are handled is isolated and the components handling the wafers in that compartment are made of a fluorinated plastic. The actuators driving the motion of the wafer handling components are located in another compartment. A rinsing device in the wafer handling compartment is activated and deactivate for rinsing one of the wafers without the use of valves in the rinse line.
48 Citations
24 Claims
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1. Apparatus for use in automatically cleaning semiconductor wafers, the apparatus comprising:
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a wafer entry station for receiving multiple wafers held in a vertical orientation; first wafer transfer means for transferring one wafer at a time from the wafer entry station without changing the vertical orientation of said one wafer; a spin dryer constructed for receiving said one wafer from said first wafer transfer means and holding said one wafer in a vertical orientation, the spin dryer being rotatable about an axis passing generally through the center of said one wafer received from said first wafer transfer means at a rate of rotation selected to throw liquid on said one wafer off of the wafer; second wafer transfer means for transferring said one wafer from the spin dryer in a vertical orientation; a wafer exit station for receiving said one wafer from said second wafer transfer means in a vertical orientation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification