Capacitor comprising improved TaO.sub.x -based dielectric
First Claim
1. Article comprising a capacitor comprising two electrically conductive members, and a first dielectric layer therebetween;
- CHARACTERIZED IN THATthe first dielectric layer consists essentially of tantalum (Ta), aluminum (Al), oxygen (O) and nitrogen (N).
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Abstract
A dielectric layer consisting essentially of Ta, Al, oxygen and nitrogen can have advantageous properties that make such a layer useful for thin film capacitors, typically capacitors for Si integrated circuits. For instance, a significantly greater fraction of capacitors according to the invention than of prior art tantalum oxide capacitors can store a charge of 3 μcoulomb/cm2. In a currently preferred embodiment, the dielectric layer has composition Ta1-y Aly Ox Nz, with y˜0.1, x˜2.4, and z˜0.02. The dielectric layer can be formed by sputter deposition or any other appropriate deposition technique, e.g., chemical vapor deposition.
76 Citations
6 Claims
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1. Article comprising a capacitor comprising two electrically conductive members, and a first dielectric layer therebetween;
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CHARACTERIZED IN THAT the first dielectric layer consists essentially of tantalum (Ta), aluminum (Al), oxygen (O) and nitrogen (N). - View Dependent Claims (2, 3, 4, 5, 6)
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Specification