Diagnosis process of vacuum failure in a vacuum chamber

• US 5,979,225 A
• Filed: 08/26/1997
• Issued: 11/09/1999
• Est. Priority Date: 08/26/1997
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Zhou, Jiaxiang
• Primary Examiner(s): BROCK, MICHAEL J
• Application Number:
  US08/918,480
• Time in Patent Office: 805 Days
• Field of Search: 73/40, 73/40.7, 73/49.2, 417/1, 417/9, 417/19, 118/724, 118/712, 118/50, 118/50.1, 118/642
• US Class Current: 73/40.7
• CPC Class Codes: G01M 3/226 for containers, e.g. radiators
• CPC Class Codes: G01M 3/3236 by monitoring the interior space of the containers

Abstract

A quick set of procedures for diagnosing the cause of a failure in a vacuum system having a pump and a chamber is disclosed. If the base pressure of the system has failed, but the rate of rise has not, then the most likely cause of the failure may be in the pump. If the rate of rise has failed, but the base pressure has not, then the most likely cause of the failure may be in the chamber. If the base pressure and rate of rise have both failed, then the most likely cause of the failure is in the chamber, but there is a slight chance of a failure in the pump. Measurements of the partial pressures of certain residual gases in the system may indicate a leak in the system. Measurements of the partial pressures of certain residual gases while tuning off and on the lamps in the system may indicate a leak in the lamps. Measurements of the partial pressure of helium or other relevant gas, while moving a source of helium around the outside surface of the system, may determine the location of a leak.

Claims

1. A method of determining a location and cause of a failure in a vacuum system having a pump having an outside surface and a chamber having an outside surface, comprising:

a observing a base pressure in the chamber to determine the likely cause of failure to be the pump and observing a rate of rise in the chamber to determine the likely cause of the failure to be the chamber;

(b) monitoring a quantity of a first substance in the vacuum system;

(c) moving a source of the first substance around the outside surface of the pump or the outside surface of the chamber depending on the likely cause of the failure as determined by (a); and

(d) isolating the leak in the vacuum system to a location on the vacuum system adjacent the source of the first quantity of the first substance.

2. The method of claim 1 wherein the first substance is a detectable inert gas.

3. The method of claim 1 wherein the first substance is helium.

4. A method of determining a location and cause of a failure in a vacuum system having a pump having an outside surface and a chamber having an outside surface, comprising:

(a) determining a base pressure of the system;

comparing the base pressure with a qualifying pressure, a base pressure greater than the qualifying pressure indicating that the vacuum system has a base pressure failure;

determining a rate of rise of the system;

comparing the rate of rise with a qualifying rate of rise, a rate of rise greater than the qualifying rate of rise indicating that the vacuum system has a rate of rise failure;

when the vacuum system has a base pressure failure and does not have a rate of rise failure, determining the most likely location of the cause of the failure to be in the pump;

when the vacuum system has a rate of rise failure, determining the most likely location of the cause of the failure to be in the chamber;

(b) monitoring a quantity of a first substance in the vacuum system;

(c) moving a source of the first substance around the outside surface of the pump and the outside surface of the chamber; and

(d) determining the location of a leak in the vacuum system, a rise in the quantity of the first substance when the source of the first substance is at a particular location on the outside surface of the pump or the outside surface of the chamber indicating the location of the leak at the particular location;

(e) when the most likely location of the cause of the failure is determined to be in the pump, moving the source of the first substance around only the outside surface of the pump; and

(f) when the most likely location of the cause of the failure is determined to be in the chamber, moving the source of the first substance around only the outside surface of the chamber.

5. The method of claim 4 further comprising:

(g) prior to the monitoring step;

determining a quantity of at least one second substance in the vacuum system;

determining a quantity of a third substance in the vacuum system; and

determining whether the cause of the failure is a leak by comparing the quantity of the at least one second substance with the quantity of the third substance, a greater quantity of the at least one second substance than of the third substance indicating that the cause of the failure is a leak.

6. The method of claim 5 wherein the second substance is a detectable gas selected from the group consisting of nitrogen, carbon monoxide, oxygen and argon.

7. The method of claim 6 wherein the third substance is water vapor.

8. The method of claim 4 further comprising:

(g) replacing the pump when step (a) determines the most likely location of the cause of the failure to be in the chamber, but steps(b), (c), (d) and (f) do not determine the location of a leak.

9. A method of determining a location and cause of a failure in a vacuum system having a pump and a chamber and a lamp disposed within the chamber, the method comprising:

(a) monitoring a quantity of a substance in the vacuum system;

(b) turning off the lamp for a first time period;

(c) turning on the lamp for a second time period; and

(d) determining that the lamp is leaking the substance into the chamber where a higher quantity of the substance is monitored during the second time period than during the first time period.

10. The method of claim 9 wherein the substance is a detectable gas and the lamp comprises the detectable gas.

11. The method of claim 9 wherein the substance is argon and the lamp comprises argon.

12. The method of claim 9 further comprising:

(e) prior to step (a);

determining a base pressure of the system;

comparing the base pressure with a qualifying pressure, a base pressure greater than the qualifying pressure indicating that the vacuum system has a base pressure failure;

determining a rate of rise of the system;

comparing the rate of rise with a qualifying rate of rise, a rate of rise greater than the qualifying rate of rise indicating that the vacuum system has a rate of rise failure;

when the vacuum system has a base pressure failure and does not have a rate of rise failure, determining the most likely location of the cause of the failure to be in the pump;

when the vacuum system has a rate of rise failure, determining the most likely location of the cause of the failure to be in the chamber; and

when the most likely location of the cause of the failure is determined to be in the chamber, performing steps (a) through (d).

13. A method of determining a location and cause of a failure in a vacuum system comprising a pump side and a chamber and a lamp disposed within the chamber, the method comprising:

(a) measuring a first pressure of a first substance in a first steady state in the chamber;

(b) turning on the lamp;

(c) measuring a second pressure of the first substance in a second steady state in the chamber; and

(d) determining that the lamp is leaking the first substance into the chamber where the first pressure is higher than the second pressure.

14. The method of claim 13 wherein the substance is a detectable gas and the lamp comprises the detectable gas.

15. The method of claim 13 wherein the substance is argon and the lamp comprises argon.

16. The method of claim 13 further comprising:

(e) prior to step (a);

(i) determining a rate of rise of the system;

(ii) comparing the rate of rise with a qualifying rate of rise, a rate of rise greater than the qualifying rate of rise indicating that the vacuum system has a rate of rise failure; and

(iii) determining the likely location of the leak to be in the chamber.

17. The method of claim 16 further comprising:

(f) subsequent to (e) and prior to (a);

(i) moving the source of the first substance around an outside surface of the chamber; and

(ii) isolating the leak in the vacuum system to a location on the chamber adjacent the source of the first substance at which the quantity of the first substance in the vacuum system rises.

18. The method of claim 13 further comprising:

(e) prior to step (a);

(i) determining a quantity of one or more second substances in the vacuum system;

(ii) determining a quantity of a third substance in the vacuum system; and

(iii) comparing the quantity of the one or more second substances with the quantity of the third substance; and

(iv) determining a greater quantity of the one or more second substances than of the third substance.

19. The method of claim 18 wherein the one or more second substances comprises argon.