Raster-scan photolithographic reduction system

• US 5,982,475 A
• Filed: 09/30/1997
• Issued: 11/09/1999
• Est. Priority Date: 09/30/1997
• Status: Expired due to Fees

• Current Assignee: Tropel Corp. (Corning Incorporated)
• Original Assignee: Tropel Corp. (Corning Incorporated)
• Inventors: Bruning, John H.
• Primary Examiner(s): Mathews, Alan A.
• Application Number:
  US08/941,120
• Time in Patent Office: 770 Days
• Field of Search: 355/53, 355/67, 355/71, 355/50, 355/77
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Abstract

A reduction photolithographic scanning system uses a reduction lens with a circular image field that is shaped to an irregular hexagonal configuration affording different effective scanning widths so that the full area of a microcircuit image can be scanned onto a substrate in an integer number of overlapping scans. This minimizes the number of scans required for each image area and maximizes the total image area that can be scanned per time unit.

Claims

1. A reduction photolithography system using a reduction lens forming a circular image field in a plane of a substrate to be imaged and an illumination system for shaping the image field to a hexagonal configuration for raster scanning, the system comprising:

a. the illumination system being variable for providing the hexagonal configuration with different length sides subtending different angles and disposed as cords of the circular field;

b. a pair of parallel and equal length sides of the hexagonal configuration being disposed perpendicular to a scan direction and having variable lengths that establish a width of a full-exposure region of a scan; and

c. a pair of congruent isosceles triangles having bases parallel with the scan direction and extending between ends of the parallel sides, and the triangles providing half-exposure regions for overlap of successive scans.

2. The system of claim 1 wherein the variable length of the parallel sides of the hexagonal configuration perpendicular to the scan direction are selected so that a full area of a pattern for a microcircuit device is scanned onto a substrate in an integer number of substantially equal scans.

3. The system of claim 1 wherein the reduction lens is a catadioptric achromatized lens.

4. The system of claim 1 wherein the overlap of successive scans equals a base-to-apex height of the triangles and varies with the length of the sides perpendicular to the scan direction.

5. The system of claim 1 wherein the triangles have apexes intersecting the circular field.

6. The system of claim 1 wherein the reduction lens is a monochromatic refractive lens formed substantially of a single material, and the illuminating system uses a narrow bandwidth of illumination.

7. A reduction photolithographic system using a reduction lens forming a circular image field at a plane of a substrate to be imaged from a reticle, and an illuminating system for shaping the image field to a hexagonal configuration for raster scanning a microcircuit pattern of the reticle onto the substrate, the system comprising:

a. the hexagonal configuration of the image field being variably irregular so that sides of the hexagonal configuration having different lengths are arranged as cords of the circular image field which is smaller than a region of the substrate exposed to an image of the microcircuit pattern; and

b. two parallel and opposite sides of the hexagonal configuration being variable in height and disposed perpendicular to a scan direction, the variable height of the opposite sides being selected so that the hexagonal configuration can scan a full image of the microcircuit pattern uniformly onto the region of the substrate in an integer number of substantially equal scans.

8. The system of claim 7 wherein the microcircuit pattern scanned onto the substrate serves as a reticle for forming a microcircuit device conforming to the pattern.

9. The system of claim 7 wherein the scanned region of the substrate forms a layer of a microcircuit device.

10. The system of claim 7 wherein the reduction lens is a catadioptric lens achromatized over a range of a deep UV source of actinic radiation.

11. The system of claim 10 wherein the lens has a reduction element with a concave, half-reflecting external surface and a concave, fully reflecting internal surface with a central aperture upstream of the image field.

12. The system of claim 7 wherein overlap between successive scans of the hexagonal configuration varies with the height of the opposite sides.

13. The system of claim 12 wherein the overlap is imaged by variable triangular regions of successive scans.

14. The system of claim 7 wherein the reduction lens is a monochromatic refractive lens formed substantially of a single material, and the illuminating system uses a narrow bandwidth of illumination.

15. In a raster-scan system for reduction photolithography using a catadioptric reduction lens having a circular image field at a plane of a substrate to be imaged from a reticle pattern for a microcircuit device and an illumination system for shaping the image field to a configuration that allows raster scanning, the improvement comprising:

a. the image field being formed as an irregular polygon having sides disposed as cords of the circular image field, the sides having variable lengths selected so that an integer number of scans of a viewing field of the lens across the reticle pattern images the reticle pattern uniformly on the substrate with each of the scans being substantially equal; and

b. the reduction lens being achromatized over a range of a deep UV source of actinic radiation and having a reduction element with a concave half-reflecting external surface and a concave fully reflecting internal surface with a central aperture upstream of the image field.

16. The improvement of claim 15 wherein the irregular polygon is a hexagon.

17. The improvement of claim 16 wherein an opposed pair of parallel and variable length sides of the hexagon are disposed perpendicular to a scan direction.

18. The improvement of claim 15 wherein the substrate imaged with the reticle pattern is a layer of a microcircuit device.

19. The improvement of claim 15 wherein the irregular polygon has a pair of parallel opposite sides disposed perpendicular to a scan direction to establish a full-exposure scan width, and regions of the polygon alongside the full-exposure region provide reduced exposure for overlap of successive scans.

20. The improvement of claim 19 wherein the reduced exposure regions are triangular.

21. A reduction photolithographic raster-scanning method comprising:

a. variably illuminating a circular image field of a reduction lens to form the image field as an irregular hexagon having variable length sides disposed as cords of the circular image field; and

b. dimensioning the sides of the hexagon to form successive scans of full-exposure regions of the hexagon and overlapped half-exposure regions of the hexagon that uniformly expose a full area of a microcircuit pattern onto a region of a substrate in an integer number of substantially equal scans.

22. The method of claim 21 including using a catadioptric reduction lens that is achromatized over the wavelength range of a light source for the scans.

23. The method of claim 22 including using within the reduction lens a reducing element having a concave, half-reflecting external surface and a concave, fully reflecting internal surface with a central aperture upstream of the image field.

24. The method of claim 21 including varying the overlapped width of the half-exposure regions inversely with a width of the full-exposure regions.

25. The method of claim 21 including using a monochromatic refractive reduction lens and a narrow bandwidth light source for the scans.

26. A method of raster scanning a reduced image of a microcircuit reticle pattern onto a substrate for photolithographic purposes, the method using a catadioptric reduction lens having a circular image field at a plane of the substrate, and the method comprising:

a. confining illumination of the circular image field to a region within cords forming an irregular hexagon having corners intersecting the circular image field; and

b. varying the length of parallel cords of the hexagon disposed perpendicular to a scanning direction so that exposure of the substrate from overlapped scans of the hexagon uniformly images the full area of the microcircuit pattern onto the substrate in an integer number of substantially equal scans.

27. The method of claim 26 including directing each of the integer number of scans to traverse a portion of the microcircuit pattern and a region of the substrate exposed to an image of the microcircuit pattern.

28. The method of claim 26 including using within the reduction lens a reduction element with a half-reflecting concave external surface and a fully reflecting concave internal surface with a central aperture upstream of the image field.

29. The method of claim 28 including achromatizing the reduction lens over the range of a source of actinic radiation for the scanning.

30. The method of claim 26 including overlapping successive scans by overlap widths that vary inversely with the length of the cords perpendicular to the scanning direction.

31. The method of claim 26 including using a monochromatic refractive reduction lens and a narrow bandwidth light source for the scans.

32. A reduction photolithographic system for imaging a reticle pattern of a microcircuit device onto a substrate with a reduction lens having a circular image field smaller than a region of the substrate exposed to the reticle pattern, the system comprising:

a. an illumination system for shaping the image field to an irregular hexagonal shape having sides disposed as cords of the image field;

b. a portion of the hexagonal shape between parallel sides oriented perpendicular to a scan direction forming a full exposure of a portion of the reticle pattern onto a corresponding portion of the substrate region with each scan;

c. overlapping half-exposure regions of the hexagonal shape being positioned for double exposing portions of the reticle pattern onto the substrate region in zones between successive scans; and

d. dimensions of the irregular hexagonal shape being selected so that the full exposure portions and the double exposing portions combine for uniformly exposing the substrate region to the full reticle pattern in an integer number of substantially equal scans.

33. The system of claim 32 wherein the reduction lens is a catadioptric lens achromatized over a range of a deep UV source of actinic radiation.

34. The system of claim 33 wherein the lens has a reduction element with a concave, half-reflecting external surface and a concave, fully reflecting internal surface with a central aperture upstream of the image field.

35. The system of claim 32 wherein a width of the zones between successive scans varies inversely with a width of the full-exposure portion.

36. The system of claim 32 wherein the half-exposure regions are triangular.

37. The system of claim 32 wherein the reduction lens is a monochromatic refractive lens formed substantially of a single material, and the illuminating system uses a narrow bandwidth of illumination.