Photosensitive composition comprising aryl-substituted polysilane and peroxide-substituted benzophenone

• US 5,985,513 A
• Filed: 05/29/1997
• Issued: 11/16/1999
• Est. Priority Date: 05/29/1996
• Status: Expired due to Fees

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Nakano, Yoshihiko, Hayase, Shuji, Kani, Rikako
• Primary Examiner(s): Nuzzolillo, Maria
• Assistant Examiner(s): WEINER, LAURA S
• Application Number:
  US08/865,067
• Time in Patent Office: 901 Days
• Field of Search: 430/270.1, 522/46, 522/60
• US Class Current: 430/270.1
• CPC Class Codes: C08K 5/14 Peroxides
• CPC Class Codes: C08L 83/16 in which all the silicon atoms are connected by linkages other than oxygen atoms
• CPC Class Codes: G03F 7/0754 Non-macromolecular compounds containing silicon-to-silicon bonds G03F7/0752 takes precedence
• CPC Class Codes: G03F 7/0757 Macromolecular compounds containing Si-O, Si-C or Si-N bonds G03F7/0752 takes precedence

Abstract

The present invention relates to a photosensitive composition comprising a polysilane having a repeating unit represented by the following general formula (1) and a benzophenone type compound having an organic peroxide, ##STR1## wherein Ar represents a substituted or unsubstituted aryl group.

Claims

1. A photosensitive composition comprising a polysilane having a repeating unit represented by the following general formula (1) and a benzophenone compound having an organic peroxide;

##STR17## wherein Ar represents a substituted or unsubstituted aryl group, wherein a light-exposed portion of said composition becomes soluble in an alkaline solution by decomposition of said polysilane.

2. The photosensitive composition according to claim 1, which further comprises an alkali-soluble organic compound.

3. The photosensitive composition according to claim 1, which further comprises a cross-linking agent for polysilane.

4. The photosensitive composition according to claim 1, wherein said benzophenone compound having an organic peroxide is at least one selected from compounds represented by the following general formula (2) to (4):

##STR18## where R¹ and R² may be the same or different and represent a group having an organic peroxide;

X is an oxygen atom or sulfur atom;

Y is an oxygen atom, sulfur atom, --CH₂ -- or --N(R³)-- whereupon R³ is an alkyl group; and

m and n independently represent an integer of 0 to 5 whereupon m and n are not simultaneously 0.

5. The photosensitive composition according to claim 4, wherein said benzophenone compound having an organic peroxide is a compound represented by the above general formula (2) and both m and n are 2 in the above general formula (2).

6. The photosensitive composition according to claim 4, which further comprises an alkali-soluble organic compound.

7. The photosensitive composition according to claim 1, wherein said polysilane generates a Si--OH bond and said benzophenone compound having an organic peroxide decomposes to generate a photodecomposed product having solubility in a aqueous alkali solution upon exposer to light, thereby said composition becomes soluble in an alkaline solution upon exposure to light.