Method and apparatus for detecting arcs
First Claim
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1. A plasma processing apparatus having a control system, comprising:
- a power supply having a power supply line for connection to a powered electrode in a plasma chamber for providing an operating voltage to said powered electrode;
an arc detector connected to said power supply line for detecting arcs during processing, said arc detector utilizing a first threshold voltage less than said operating voltage and a second threshold voltage less than said first threshold voltage to determine presence and magnitude of an arc relative to said first and second threshold voltages; and
a controller connected to said arc detector to measure an arc-related parameter, said controller further comprising a control line capable of providing a signal based on said parameter.
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Abstract
The present invention is a thin film deposition tool with arc detection capabilities. An arc detector is provided in the power supply line between the power supply and the sputter deposition tool. Arcs are detected by the arc detector and counted using a logic circuit. Arc data is collected and analyzed and real-time data is provided which can be used to stop further processing until a repair is made.
64 Citations
27 Claims
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1. A plasma processing apparatus having a control system, comprising:
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a power supply having a power supply line for connection to a powered electrode in a plasma chamber for providing an operating voltage to said powered electrode; an arc detector connected to said power supply line for detecting arcs during processing, said arc detector utilizing a first threshold voltage less than said operating voltage and a second threshold voltage less than said first threshold voltage to determine presence and magnitude of an arc relative to said first and second threshold voltages; and a controller connected to said arc detector to measure an arc-related parameter, said controller further comprising a control line capable of providing a signal based on said parameter. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of detecting arcing during plasma deposition or etch processing comprising the steps of:
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(a) providing a power supply having a power supply line for connection to a powered electrode in a plasma chamber for providing an operating voltage to said powered electrode; (b) providing an arc detector in said power supply line for detecting arcs during processing, said arc detector utilizing a first threshold voltage less than said operating voltage and a second threshold voltage less than the first threshold voltage to determine presence and magnitude of an arc relative to said first and second threshold voltages; and (c) providing a controller connected to said arc detector to measure an arc related parameter, said controller further comprising a control line capable of providing a signal based on said measurement. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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Specification