Method of cleaning metallic films built up within thin film deposition apparatus

• US 5,993,679 A
• Filed: 05/05/1998
• Issued: 11/30/1999
• Est. Priority Date: 11/06/1997
• Status: Expired due to Term

• Current Assignee: Anelva Corporation (Canon Inc.)
• Original Assignee: Anelva Corporation (Canon Inc.)
• Inventors: Kobayashi, Akiko, Sekiguchi, Atsushi, Koide, Tomoaki, Tae, Ko Sang, Okada, Osamu
• Primary Examiner(s): Breneman, Bruce
• Assistant Examiner(s): Powell, Alva C
• Application Number:
  US09/072,559
• Time in Patent Office: 574 Days
• Field of Search: 148/223, 118/715, 118/683, 216/2, 216/74
• US Class Current: 216/74
• CPC Class Codes: C23C 16/4405 Cleaning of reactor or parts inside the reactor by using reactive gases
• CPC Class Codes: C23C 16/4557 Heated nozzles
• CPC Class Codes: C23C 16/45572 Cooled nozzles
• CPC Class Codes: C23F 1/12 Gaseous compositions
• CPC Class Codes: C23G 5/00 Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Abstract

A method of cleaning metallic films built up within a thin film deposition apparatus is disclosed. The method includes an oxidation step to oxidize the metallic film and produce a film of the oxide thereof, a complexing step to complex the oxide film and produce a complex thereof, and a sublimation step to sublimate the complex. The conditions of these cleaning steps are set so that the oxidation step is the rate-determining step.

Claims

1. A method of cleaning metallic films built up within a thin film deposition apparatus, said method comprising the steps of:

(a) introducing a β

-diketone into a thin film deposition apparatus having an exhaust system;

(b) then introducing oxygen, along with the β

-diketone, into the thin film deposition apparatus at a flow rate of up to 5 times the flow rate of the β

-diketone when expressed as a molar ratio and at conditions effective to oxidize the metallic film to produce a film of oxide thereof, to complex the oxide film with the β

-diketone, and to sublimate the complex; and

(c) intermittently varying the pumping speed of the exhaust system such that oxidation of the metallic film is the rate-determining step.

2. The method according to claim 1, wherein the β

-diketone is hexafluoroacetylacetone.

3. The method according to claim 1, wherein the temperature inside the thin film deposition apparatus during steps (a) through (c) ranges from 100 to 400°

C., and the pressure inside the thin film deposition apparatus is such that the partial pressure of oxygen is from 100 mTorr to 300 Torr during steps (a) through (c).

4. The method according to claim 1, wherein the metallic film is copper.

5. A method of cleaning metallic films built up within a thin film deposition apparatus, said method comprising the steps of:

(a) simultaneously introducing oxygen and β

-diketone into a thin film deposition apparatus having an exhaust system, wherein said oxygen is introduced at a flow rate of up to 5 times the flow rate of the β

-diketone when expressed as a molar ratio and at conditions effective to oxidize the metallic film to produce a film of oxide thereof, to complex the oxide film with the β

-diketone, and to sublimate the complex; and

(b) intermittently varying the pumping speed of the exhaust system such that oxidation of the metallic film is the rate-determining step.

6. The method according to claim 5, wherein the β

-diketone is hexafluoroacetylacetone.

7. The method according to claim 5, wherein the temperature inside the thin film deposition apparatus during steps (a) through (b) ranges from 100 to 400°

C., and the pressure inside the thin film deposition apparatus is such that the partial pressure of oxygen is from 100 mTorr to 300 Torr during steps (a) through (b).

8. The method according to claim 5, wherein the metallic film is copper.