Method for making W/Ti sputtering targets and products in an inert atmosphere
First Claim
1. A method for the manufacture of W/Ti sputtering targets comprising the steps of:
- placing a W powder and a TiH2 powder in a container located in an inert gas atmosphere;
blending the W powder and the TiH2 powder to form a blended powder;
reducing the particle size of the blended powder to approximately 150 μ
m or less;
placing the blended powder in a die held within a containment vessel having a ram, and purging the vessel with an inert gas flow;
subjecting the blended powder to a containment pressure of about 1.3 to 4.2 MPa;
subjecting the containment vessel, die and blended powder, while continuing the inert gas flow, to a first heat/pressure cycle consisting of applying a first pressure of about 6.8 to 25 MPa to the blended powder and heating to a first temperature of about 1250°
C. to about 1350°
C., followed by cooling to room temperature;
subjecting the containment vessel, die and blended powder, while continuing the inert gas flow, to a second heat/pressure cycle consisting of a second temperature and a second pressure sufficient to dehydrate the TiH2 and to remove any other gases, forming a dehydrated blended powder;
subjecting the containment vessel, die and dehydrated blended powder, while continuing the inert gas flow, to a third heat/pressure cycle consisting of heating the die to a third temperature higher than said second temperature, and concurrently increasing the pressure to a third pressure higher than said second pressure so as to compact and alloy the dehydrated blended powder; and
releasing the third pressure, cooling the containment vessel to room temperature, and subsequently stopping the inert gas flow.
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Accused Products
Abstract
The invention relates to the manufacture of sputtering targets of tungsten-titanium alloy using high purity tungsten and titanium hydride powders. The powders are blended and placed in a containment vessel holding a die. The die is heated to a temperature of about 700° C. to about 1000° C. in an argon atmosphere while under pressure. The combination of temperature and pressure is high enough to dehydrate the titanium hydride and to remove the gases. The die is then heated to a higher temperature, in the range of about 1250° C. to 1350° C. while the pressure is increased so as to compact and alloy the powders. The pressure and temperature are held constant until there is no further movement of the ram. The resulting compacted alloy material is then machined to provide a sputtering target with a density between 96% and 100% of theoretical and a gas content less than 850 p.p.m. In a further feature of the present invention, a tungsten-titanium hydride powder may be used as the raw material for manufacturing the target. The raw materials of the present invention may be obtained by recycling used titanium targets or used tungsten-titanium targets.
19 Citations
45 Claims
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1. A method for the manufacture of W/Ti sputtering targets comprising the steps of:
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placing a W powder and a TiH2 powder in a container located in an inert gas atmosphere; blending the W powder and the TiH2 powder to form a blended powder; reducing the particle size of the blended powder to approximately 150 μ
m or less;placing the blended powder in a die held within a containment vessel having a ram, and purging the vessel with an inert gas flow; subjecting the blended powder to a containment pressure of about 1.3 to 4.2 MPa; subjecting the containment vessel, die and blended powder, while continuing the inert gas flow, to a first heat/pressure cycle consisting of applying a first pressure of about 6.8 to 25 MPa to the blended powder and heating to a first temperature of about 1250°
C. to about 1350°
C., followed by cooling to room temperature;subjecting the containment vessel, die and blended powder, while continuing the inert gas flow, to a second heat/pressure cycle consisting of a second temperature and a second pressure sufficient to dehydrate the TiH2 and to remove any other gases, forming a dehydrated blended powder; subjecting the containment vessel, die and dehydrated blended powder, while continuing the inert gas flow, to a third heat/pressure cycle consisting of heating the die to a third temperature higher than said second temperature, and concurrently increasing the pressure to a third pressure higher than said second pressure so as to compact and alloy the dehydrated blended powder; and releasing the third pressure, cooling the containment vessel to room temperature, and subsequently stopping the inert gas flow. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method for the manufacture of W/Ti sputtering targets comprising the steps of:
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placing a W powder and a TiH2 powder in a first container held inside a chamber having an argon atmosphere; blending the W powder and the TiH2 powder for about 1 to 4 hours to form a blended powder; transferring the blended powder within the chamber to a second container containing a predetermined amount of ball mill media and ball milling the blended powder for a time sufficient to reduce the particle size of the blended powder to about 50 μ
m or less;placing the blended powder in a die held within a containment vessel having a ram, and purging the vessel with an argon flow; subjecting the blended powder to a containment pressure of about 1.3 to 4.2 MPa; subjecting the containment vessel, die and blended powder, while continuing the argon flow, to a first heat/pressure cycle consisting of applying a first containment pressure of about 6.8 to 25 MPa to the blended powder and heating to a first temperature of about 1250°
C. to 1350°
C., followed by cooling to room temperature;subjecting the containment vessel, die and blended powder, while continuing the argon flow, to a second heat/pressure cycle consisting of heating the die to a second temperature of about 700°
C. to 1000°
C. and applying a second pressure of about 6.8 to 11 MPa, wherein the combination of the second temperature and second pressure is sufficient to dehydrate the TiH2 and to remove any other gases, forming a dehydrated blended powder;maintaining a second temperature and second pressure for about 2 hours or more; subjecting the containment vessel, die and dehydrated blended powder, while continuing the argon flow, to a third heat/pressure cycle consisting of heating the die to a third temperature in the range of 1250°
C. to 1350°
C. and concurrently increasing the pressure to a third pressure of about 11 to 16.5 MPa so as to compact and alloy the dehydrated blended powder;maintaining a third temperature and third pressure until there is no further movement of the ram; and releasing the third pressure, cooling the containment vessel to room temperature and subsequently stopping the argon flow. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25)
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26. A method for the manufacture of W/Ti sputtering targets comprising the steps of:
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placing a W-TiH2 powder in a chamber having an inert gas atmosphere; reducing the particle size of the W-TiH2 powder to 150 μ
m or less;placing the W-TiH2 powder in a die held within a containment vessel having a ram, and purging the vessel with an inert gas flow; subjecting the W-TiH2 powder to a containment pressure of about 1.3 to 4.2 MPa; subjecting the containment vessel, die and W-TiH2 powder, while continuing the inert gas flow, to a first heat/pressure cycle consisting of applying a first pressure of about 6.8 to 25 MPa to the W-TiH2 powder and heating to a first temperature of about 1250°
C. to 1350°
C., followed by cooling to room temperature;subjecting the containment vessel, die and W-TiH2 powder, while continuing the inert gas flow, to a second heat/pressure cycle consisting of a second temperature and a second pressure sufficient to dehydrate the W-TiH2 powder and to remove any other gases, forming a W-Ti powder; subjecting the containment vessel, die and W-Ti powder, while continuing the inert gas flow, to a third heat/pressure cycle consisting of heating the die to a third temperature higher than said second temperature, and concurrently increasing the pressure to a third pressure higher than said second pressure so as to compact and alloy the W-Ti powder; and releasing the third pressure, cooling the containment vessel to room temperature and subsequently stopping the inert gas flow. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39)
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40. A method for the manufacture of W/Ti sputtering targets comprising the steps of:
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placing a W-TiH2 powder in a container held inside a chamber having an argon atmosphere, said container containing a predetermined amount of ball mill media; ball milling the W-TiH2 powder for a time sufficient to reduce the particle size of the W-TiH2 powder to about 50 μ
m or less;placing the W-TiH2 powder in a die held within a containment vessel having a ram, and purging the vessel with an argon flow; subjecting the W-TiH2 powder to a containment pressure of about 1.3 to 4.2 MPa; subjecting the containment vessel, die and W-TiH2 powder, while continuing the argon flow, to a first heat/pressure cycle consisting of applying a first pressure of about 1.3 to 4.2 MPa to the blended powder and heating to a first temperature of about 1250°
C. to 1350°
C., followed by cooling to room temperature;subjecting the containment vessel, die and W-TiH2 powder, while continuing the argon flow, to a second heat/pressure cycle consisting of heating the die to a second temperature of about 700°
C. to 1000°
C. and applying a second pressure of about 6.8 to 11 MPa, wherein the combination of the second temperature and second pressure is sufficient to dehydrate the TiH2 and to remove any other gases, forming a W-Ti powder;maintaining a second temperature and second pressure for about 2 hours or more; subjecting the containment vessel, die and W-Ti powder, while continuing the argon flow, to a third heat/pressure cycle consisting of heating the die to a third temperature in the range of 1250°
C. to 1350°
C. and concurrently increasing the pressure to a third pressure of about 11 to 16.5 MPa so as to compact and alloy the W-Ti powder;maintaining a third temperature and third pressure until there is no further movement of the ram; and releasing the third pressure, cooling the containment vessel to room temperature and subsequently stopping the argon flow. - View Dependent Claims (41, 42, 43, 44, 45)
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Specification