Unique baffle to deflect remote plasma clean gases
First Claim
Patent Images
1. An apparatus for processing substrates, comprising:
- (a) a chamber having;
(i) a sidewall;
(ii) a lid disposed at one end of the sidewall; and
(iii) a bottom disposed at the opposite end of the lid;
(b) a substrate support member disposed in the chamber;
(c) one or more gas inlets disposed through one or more of the sidewall and the lid to admit one or more cleaning gases into the chamber;
(d) a baffle plate disposed in the chamber adjacent to the one or more gas inlets disposed in the chamber and positioned to direct the gases toward the interior surfaces of the chamber; and
(e) an exhaust port disposed in the bottom of the chamber.
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Abstract
The present invention provides an HDP-CVD tool using simultaneous deposition and sputtering of doped and undoped silicon dioxide capable of excellent gap fill and blanket film deposition on wafers. The tool of the present invention includes: a dual RF zone inductively coupled plasma source; a dual zone gas distribution system; temperature controlled surfaces within the tool; a symmetrically shaped turbomolecular pumped chamber body; a dual cooling zone electrostatic chuck; an all ceramic/aluminum alloy chamber; and a remote plasma chamber cleaning system.
77 Citations
20 Claims
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1. An apparatus for processing substrates, comprising:
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(a) a chamber having; (i) a sidewall; (ii) a lid disposed at one end of the sidewall; and (iii) a bottom disposed at the opposite end of the lid; (b) a substrate support member disposed in the chamber; (c) one or more gas inlets disposed through one or more of the sidewall and the lid to admit one or more cleaning gases into the chamber; (d) a baffle plate disposed in the chamber adjacent to the one or more gas inlets disposed in the chamber and positioned to direct the gases toward the interior surfaces of the chamber; and (e) an exhaust port disposed in the bottom of the chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An apparatus for processing substrates, comprising:
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(a) a chamber having an interior surface; (b) a fluid inlet formed in the interior surface; (c) a cleaning fluid source in communication with the fluid inlet; and (d) a baffle disposed adjacent to the fluid inlet, the baffle comprising; (i) a body; and (ii) a curved surface disposed on the body, the curved surface defining a fluid pathway; wherein the curved surface is adapted to direct an impinging cleaning fluid along the fluid pathway and onto the interior surface for cleaning. - View Dependent Claims (11, 12)
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13. A baffle for use in a processing chamber, comprising:
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(a) a body; and (b) a gas deflecting surface disposed on the body and defining a cleaning fluid pathway; wherein the baffle is adapted to be disposed adjacent a gas inlet disposed in the processing chamber to direct cleaning fluid adjacent the cleaning fluid pathway and onto an adjacent internal processing chamber surface. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A method for directing a fluid in a process chamber, comprising:
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(a) providing at least one fluid inlet in a process chamber; (b) disposing a baffle plate in the process chamber adjacent the fluid inlet; (c) allowing one or more fluids to flow in a first direction into the chamber through the fluid inlet; and (d) diverting a portion of the one or more fluids in at least a second direction at the baffle plate;
wherein the second direction directs at least a portion of the one or more fluids onto an internal surface of the chamber. - View Dependent Claims (20)
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Specification