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Unique baffle to deflect remote plasma clean gases

  • US 5,994,662 A
  • Filed: 05/29/1997
  • Issued: 11/30/1999
  • Est. Priority Date: 05/29/1997
  • Status: Expired due to Term
First Claim
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1. An apparatus for processing substrates, comprising:

  • (a) a chamber having;

    (i) a sidewall;

    (ii) a lid disposed at one end of the sidewall; and

    (iii) a bottom disposed at the opposite end of the lid;

    (b) a substrate support member disposed in the chamber;

    (c) one or more gas inlets disposed through one or more of the sidewall and the lid to admit one or more cleaning gases into the chamber;

    (d) a baffle plate disposed in the chamber adjacent to the one or more gas inlets disposed in the chamber and positioned to direct the gases toward the interior surfaces of the chamber; and

    (e) an exhaust port disposed in the bottom of the chamber.

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