Method and apparatus for flowing gases into a manifold at high potential

• US 5,996,528 A
• Filed: 07/02/1996
• Issued: 12/07/1999
• Est. Priority Date: 07/02/1996
• Status: Expired due to Term

• Current Assignee: Novellus Systems Incorporated (Lam Research Corporation)
• Original Assignee: Novellus Systems Incorporated (Lam Research Corporation)
• Inventors: Kaim, Robert, Pollock, John D., Berrian, Donald W.
• Primary Examiner(s): Breneman, Bruce
• Assistant Examiner(s): Powell, Alva C
• Application Number:
  US08/674,444
• Time in Patent Office: 1,253 Days
• Field of Search: 156/345, 118/723 E, 204/298.07, 427/569
• US Class Current: 118/723.00E
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45568 Porous nozzles
• CPC Class Codes: C23C 16/45591 Fixed means, e.g. wings, baffles
• CPC Class Codes: C23C 16/509 using internal electrodes
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

A reactor for plasma CVD or plasma etch is provided with a first electrode held to ground potential which supports the workpiece, e.g., a semiconductor wafer. A second electrode is spaced from the first electrode to form a gap therebetween, and has an electrical potential suitable to form an ionizing electrical field within the gap. The second electrode also has a gas inlet and a gas outlet. Preferably, the gas outlet includes a plurality of gas outlets. The reactor includes a porous plug constructed and arranged with the gas inlet to isolate the second electrode from ground potential. This plug has a plurality of pores which are sized to permit passage of gas therethrough and to substantially inhibit electrical discharge therein. Accordingly, gas injected through the gas inlet of the second electrode passes through the plug without ionization; and that gas thereafter exits from the gas outlet to provide substantially uniform ionization within the gap. Multiple gases and porous plugs can be used in tandem to mix and provide uniform plasma generation. A metal tube, substantially at ground potential, connects directly to the reactor and adjacent to the porous plug to provide a sturdy conduit for gases injected into the reactor and into regions of high potential.

Claims

1. A reactor for ionizing two or more gases into a substantially uniform plasma, comprising:

(A) a first electrode having substantially ground potential and means for supporting a workpiece;

(B) a second electrode spaced from the first electrode to form a gap therebetween and having a first electrical potential to form an electrical field suitable for ionizing mixed gas within the gap;

the second electrode having a plurality of gas inlets and a gas outlet;

(C) a plurality of porous plugs, each porous plug constructed and associated with a separate gas inlet to isolate the second electrode from ground potential, each plug forming a plurality of pores and being sized to permit passage of gas therethrough and to substantially inhibit electrical discharge therein; and

(D) an insulator, surrounding the porous plugs and insulating the second electrode from ground potential.

2. A reactor according to claim 1, wherein the gas outlet comprises a plurality of gas outlet apertures.

3. A reactor according to claim 1, wherein the gas outlet apertures are sized so as to create a pressure difference between the gap and a volume inside the second electrode.

4. A reactor according to claim 1, further comprising a plurality of ceramic sleeves, each sleeve separating a porous plug from the insulator to provide support between the plugs and the insulator.

5. A reactor according to claim 1, further comprising a first conductive metal mesh adjacent a first side of the plugs, the first mesh having ground potential, and a second conductive metal mesh adjacent a second side of the plugs, the second mesh being at the first potential, the first and second meshes inhibiting penetration of electric fields into the plugs and providing permeability to gases.