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Electrically programmable photolithography mask

  • US 5,998,069 A
  • Filed: 02/27/1997
  • Issued: 12/07/1999
  • Est. Priority Date: 02/27/1998
  • Status: Expired due to Term
First Claim
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1. An electronically programmable photolithography mask comprising:

  • a material having optical characteristics that are electronically controlled to provide a mask pattern, wherein the material has a first region allowing transmission of light from a light source and a second region allowing transmission of light, such that a phase of light passing through the second region is 180 degrees out-of-phase with light passing through the first region.

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