×

Use of chemical-mechanical polishing for fabricating photonic bandgap structures

  • US 5,998,298 A
  • Filed: 04/28/1998
  • Issued: 12/07/1999
  • Est. Priority Date: 04/28/1998
  • Status: Expired due to Term
First Claim
Patent Images

1. A method for fabricating a photonic bandgap structure, comprising steps for:

  • (a) forming a first layer of spaced elements of the photonic bandgap structure; and

    (b) planarizing the first layer of spaced elements by chemical-mechanical polishing.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×