Semiconductor integrated circuit and a method of manufacturing the same
First Claim
1. A semiconductor integrated circuit in which a plurality of memory cells having transistors and capacitors are arranged in a matrix manner on one major surface of a semiconductor substrate, comprising:
- a trench formed in said semiconductor substrate between said memory cells adjacent to each other; and
a conductive film filling said trench with an insulating film intervening, the insulating film covering inner wall of said trench,wherein said conductive film is a field-shield electrode for dielectrically isolating said memory cells adjacent to each other across said trench, capacitively coupled with said semiconductor substrate in said memory cells at side-wall portions of said trench through said insulating film, and constituting said capacitors of said memory cells together with said semiconductor substrate and said insulating film.
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Accused Products
Abstract
Dielectric isolation in the bit-line direction is performed by a first trench filled with an insulator, dielectric isolation in the word-line direction is performed by a second trench filled with a conductive film serving as a field-shield electrode interposing an insulating film, and capacitors are formed on side walls of the second trench by the conductive film and a semiconductor substrate with the insulating film interposed therebetween. A high-density, large-scale DRAM is realized by combining the technologies of field-shield element isolation, trench element isolation, and side-wall capacitors in a trench. In this DRAM, the conductive film in a trench-capacitor structure serves as a field-shield electrode in a field-shield structure for dielectric isolation between memory cells. Since the capacitor forms a capacitance inside the semiconductor substrate on one side wall of the trench, high-density integration is possible. This further increases the density and the scale of a semiconductor integrated circuit.
60 Citations
19 Claims
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1. A semiconductor integrated circuit in which a plurality of memory cells having transistors and capacitors are arranged in a matrix manner on one major surface of a semiconductor substrate, comprising:
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a trench formed in said semiconductor substrate between said memory cells adjacent to each other; and a conductive film filling said trench with an insulating film intervening, the insulating film covering inner wall of said trench, wherein said conductive film is a field-shield electrode for dielectrically isolating said memory cells adjacent to each other across said trench, capacitively coupled with said semiconductor substrate in said memory cells at side-wall portions of said trench through said insulating film, and constituting said capacitors of said memory cells together with said semiconductor substrate and said insulating film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification