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Measurement system for detecting chemical species within a semiconductor processing device chamber

  • US 5,999,886 A
  • Filed: 09/05/1997
  • Issued: 12/07/1999
  • Est. Priority Date: 09/05/1997
  • Status: Expired due to Term
First Claim
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1. A measurement system for detecting the presence of a chemical species within a chamber of a semiconductor wafer processing device, comprising:

  • a sensor for sampling a gaseous environment within the chamber, wherein the sensor is coupled to receive a control signal and configured to produce a data signal in response to the control signal, and wherein the data signal is indicative of chemical species within the gaseous environment;

    a control interface coupled to the sensor for producing the control signal and for receiving and thereafter providing the data signal (i) during the processing of a semiconductor wafer within the semiconductor wafer processing device, and (ii) following a maintenance activity performed upon the semiconductor wafer processing device;

    a data collection computer coupled to receive the data signal from the control interface and configured to store the data signal; and

    wherein the control interface is coupled to receive a pressure signal, and wherein a present value of the pressure signal indicates normal operation of the semiconductor wafer processing device, and wherein past values of the pressure signal are indicative of the performance of a maintenance activity upon the semiconductor wafer processing device, and wherein the control interface is configured to assert the control signal dependent upon present and past values of the pressure signal.

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