Measurement system for detecting chemical species within a semiconductor processing device chamber
First Claim
1. A measurement system for detecting the presence of a chemical species within a chamber of a semiconductor wafer processing device, comprising:
- a sensor for sampling a gaseous environment within the chamber, wherein the sensor is coupled to receive a control signal and configured to produce a data signal in response to the control signal, and wherein the data signal is indicative of chemical species within the gaseous environment;
a control interface coupled to the sensor for producing the control signal and for receiving and thereafter providing the data signal (i) during the processing of a semiconductor wafer within the semiconductor wafer processing device, and (ii) following a maintenance activity performed upon the semiconductor wafer processing device;
a data collection computer coupled to receive the data signal from the control interface and configured to store the data signal; and
wherein the control interface is coupled to receive a pressure signal, and wherein a present value of the pressure signal indicates normal operation of the semiconductor wafer processing device, and wherein past values of the pressure signal are indicative of the performance of a maintenance activity upon the semiconductor wafer processing device, and wherein the control interface is configured to assert the control signal dependent upon present and past values of the pressure signal.
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Accused Products
Abstract
A measurement system is presented for detecting the presence of one or more harmful chemical species within one or more chambers of a semiconductor wafer processing device. Chemical species of interest include oxygen (O2), nitrogen (N2), moisture (H2 O), and organic compounds associated with photoresist processing. Such organic compounds include isopropyl alcohol (CH3 CH(OH)CH3), acetone (CH3 COCH3), and ethyl-3-ethoxy propionate (C7 H14 O3). Candidate semiconductor wafer processing devices include evaporation, sputtering, and low pressure chemical vapor deposition (LPCVD) devices. The measurement system measures the concentrations of chemical species within each monitored chamber of the semiconductor wafer processing device: (i) during the processing of semiconductor wafers within the semiconductor wafer processing device, and (ii) during recovery periods following preventive maintenance or repair activities performed upon the semiconductor wafer processing device. Performing measurements during recovery periods aids in returning the semiconductor wafer processing device to service following preventive maintenance or repair activities. Data collection is not performed at other times (e.g., when the semiconductor wafer processing device is idle) in order to reduce data storage requirements. The measurement system includes one or more ambient sampling sensors coupled to a data collection computer through a control interface. Each ambient sampling sensor is in gaseous communication with ambients within the one or more monitored chambers. The control interface triggers data collection during the processing of one or more semiconductor wafers within the semiconductor wafer processing device, and following a maintenance activity performed upon the semiconductor wafer processing device.
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Citations
26 Claims
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1. A measurement system for detecting the presence of a chemical species within a chamber of a semiconductor wafer processing device, comprising:
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a sensor for sampling a gaseous environment within the chamber, wherein the sensor is coupled to receive a control signal and configured to produce a data signal in response to the control signal, and wherein the data signal is indicative of chemical species within the gaseous environment; a control interface coupled to the sensor for producing the control signal and for receiving and thereafter providing the data signal (i) during the processing of a semiconductor wafer within the semiconductor wafer processing device, and (ii) following a maintenance activity performed upon the semiconductor wafer processing device; a data collection computer coupled to receive the data signal from the control interface and configured to store the data signal; and wherein the control interface is coupled to receive a pressure signal, and wherein a present value of the pressure signal indicates normal operation of the semiconductor wafer processing device, and wherein past values of the pressure signal are indicative of the performance of a maintenance activity upon the semiconductor wafer processing device, and wherein the control interface is configured to assert the control signal dependent upon present and past values of the pressure signal. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A measurement system for detecting the presence of a chemical species within a deposition chamber of a deposition system, comprising:
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a sensor for sampling a gaseous environment within the deposition chamber, wherein the sensor is coupled to receive a control signal, and wherein the sensor is configured to produce an analog data signal in response to the control signal, and wherein the analog data signal is indicative of the presence of the chemical species within the deposition chamber; a control interface coupled to the sensor, wherein the control interface is configured to receive; the analog data signal; a processing signal indicative of the processing of a semiconductor wafer within the deposition chamber; and a first pressure signal, wherein a present value of the first pressure signal is indicative of normal operation of the deposition system, and wherein past values of the first pressure signal are indicative of the performance of a maintenance activity upon the deposition chamber; wherein the control interface is configured to convert the analog data signal to a digital data signal and to provide the digital data signal, and wherein the control interface is configured to produce the control signal dependent upon the processing signal and the present and past values of the first pressure signal; and a data collection computer coupled to receive the digital data signal from the control interface and to store the digital data signal. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification