Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit

• US 6,002,208 A
• Filed: 07/02/1998
• Issued: 12/14/1999
• Est. Priority Date: 07/02/1998
• Status: Expired due to Fees

• Current Assignee: Advanced Ion Beam Technology Incorporated
• Original Assignee: Advanced Ion Beam Technology Incorporated
• Inventors: Velikov, Leonid, Ritter, James, Maishev, Yuri
• Primary Examiner(s): Bettendorf, Justin P.
• Application Number:
  US09/109,684
• Time in Patent Office: 530 Days
• Field of Search: 315/111.31, 315/111.41, 315/111.81, 315/111.91, 250/492.23, 250/423 R
• US Class Current: 315/111.91
• CPC Class Codes: H01J 27/143 Hall-effect ion sources with closed electron drift

Abstract

A universal cold-cathode type ion source with a closed-loop electron drifting source and with an ion-beam propagation direction perpendicular to the plane of electron drifting is intended for uniformly treating stationary or moveable objects with such processes as cleaning, activation, polishing, thin-film coating, or etching. The ion source of the invention allows adjustment of beam parameters and configurations and has an ion emitting slit of an adjustable geometry. In one embodiment, the adjustment is carried out by changing the width of the slit by shifting moveable parts of the cathode in the direction perpendicular to the direction of the ion beam. In another embodiment the slit configuration is adjusted by shifting a moveable part of the cathode in the direction of the beam propagation. The invention also provides a method for adjusting the shape and configuration of the ion beam with respect to the object to be treated. The adjustment can be performed during the operation of the ion beam while observing the beam through a sealed transparent window of the vacuum chamber.

Claims

1. A universal ion beam source with a closed-loop ion-emitting slit capable of emitting an ion beam toward an object located in a position reachable by said ion beam, comprising:

a hollow housing that functions as a cathode of said ion beam source;

an anode located in said hollow housing and spaced from said cathode to form an ionization gap therebetween for ionization and acceleration of ions formed in said gap during operation of said ion beam source,

magnetic field generating means in magnetoconductive relationship with said anode and said cathode for forming closed magnetoconductive circuit passing through said anode, said ionization gap, said cathode, and said magnetic field generating means;

a closed-loop ion emitting slit formed in said cathode in the path of said magnetoconductive circuit, said closed-loop ion emitting slit having predetermined geometric dimensions defined by an inner profile and an outer profile;

electric power supply means for maintaining said anode under a positive charge and said cathode under a negative charge with respect to said anode;

means for the supply of a working medium into said hollow housing of said cathode to form an ion beam when said working medium passes through said ionization gap, said beam having a direction of propagation towards said object; and

means for adjusting said predetermined geometric dimensions of said closed-loop ion emitting slit and thus for adjusting performance characteristics of said ion beam source,

said cathode having a stationary part and a moveable part, said means for adjusting said predetermined geometric dimensions of said closed-loop ion emitting slit comprising means for moving said moveable part of said cathode with respect to said stationary part of said cathode.

2. The ion beam source of claim 1, wherein one of said predetermined geometric dimensions is the width of said closed-loop ion emitting slit and wherein said moveable part of said cathode defines said width and is moveable in the direction perpendicular to said direction of propagation of said ion beam.

3. The ion beam source of claim 2, wherein said moveable part of said cathode consists of two members that define two opposite sides of said closed-loop ion emitting slit and that are moveable simultaneously and in mutually opposite directions.

4. The ion beam source of claim 3, wherein said magnetic field generating means is at least one permanent magnet.

5. The ion beam source of claim 4, wherein said closed-loop ion emitting slit has a shape selected from a group consisting of rectangular, circular, oval, and elliptic shapes.

6. The ion beam source of claim 1, wherein said means for adjusting has a first part connected to said moveable pan of said cathode and a second part that extends outside said hollow housing through sealing means for controlling movements of said moveable part of said cathode from outside of said universal ion beam source.

7. The ion beam source of claim 1, wherein said means for adjusting is at least one screw having a round head freely rotating in a recess formed in said moveable part of said cathode and a threaded portion engageable with a threaded opening in a part stationary with respect to said moveable part of said cathode.

8. The ion beam source of claim 1, wherein said hollow housing has guides for guiding said moveable part in said direction of propagation of said beam towards said object.

9. The ion beam source of claim 8, wherein said moveable part of said cathode is a central part of said cathode which defines said inner profile of said ion-emitting slit.

10. The ion beam source of claim 9, wherein said magnetic field generating means is at least one permanent magnet.

11. The ion beam source of claim 10, wherein said closed-loop ion emitting slit has a shape selected from a group consisting of rectangular, circular, oval, and elliptic shapes.

12. The ion beam source of claim 11, wherein said magnetic field generating means is connected to said moveable part of said cathode for moving integrally therewith.

13. The ion beam source of claim 12, wherein said means for adjusting has a first part connected to said moveable part of said cathode and a second part that extends outside said hollow housing through sealing means for controlling movements of said moveable part of said cathode from outside of said universal ion beam source.

14. The ion beam source of claim 13, wherein said hollow housing has a guide portion, said guide portion containing a guide member which is connected to said permanent magnet, and said means for adjusting being made in the form of at least one screw having a round head freely rotating in a recess formed in said second part and a threaded portion engageable with a threaded opening in a part stationary with respect to said moveable part.

15. A method for adjusting performance characteristics of an ion beam source with a closed-loop ion emitting slit of predetermined geometric dimensions, comprising the steps of:

providing said ion-beam source with means for adjusting said predetermined geometric dimensions of said closed-loop ion emitting slit; and

adjusting performance characteristics of said ion beam by changing said predetermined geometric dimensions of said closed-loop ion emitting slit, said step of adjustment being performed by adjusting the width of said closed-loop ion emitting slit, said ion beam source having a cathode comprising a stationary part and a moveable part, said adjustment being performed by moving said moveable part of said cathode in the direction perpendicular to the direction of propagation of said ion beam.

16. A method for adjusting performance characteristics of an ion beam source with a closed-loop ion emitting slit of predetermined geometric dimensions, comprising the steps of:

providing said ion-beam source with means For adjusting said predetermined geometric dimensions of said closed-loop ion emitting slit; and

adjusting performance characteristics of said ion beam by changing said predetermined geometric dimensions of said closed-loop ion emitting slit, said step of adjustment being performed by adjusting the width of said closed-loop ion emitting slit, said ion beam source having a cathode comprising a stationary part and a moveable part, said adjustment is performed by moving said moveable part of said cathode in the direction of propagation of said ion beam.

17. A method for adjusting performance characteristics of ion beam source with a closed-loop ion emitting slit of predetermined geometric dimensions, comprising the steps of:

providing said ion-beam source with means for adjusting said predetermined geometric dimensions of said closed-loop ion emitting slit;

generating an ion beam by means of said ion beam source;

directing said ion beam onto the surface of an object to be treated;

observing the shape of said ion beam and its location with respect to said surface of said object; and

adjusting performance characteristics of said ion beam by changing said predetermined geometric dimensions of said closed-loop ion emitting slit while observing said shape and location of said ion beam, said step of adjustment being performed by adjusting the width of said closed-loop ion emitting slit;

said ion beam source having a cathode comprising a stationary part and a moveable

part, said adjustment being performed by moving said moveable part of said cathode in the direction perpendicular to the direction of propagation of said ion beam.

18. A method for adjusting performance characteristics of ion beam source with a closed-loop ion emitting slit of predetermined geometric dimensions, comprising the steps of:

providing said ion-beam source with means for adjusting said predetermined geometric dimensions of said closed-loop ion emitting slit;

generating an ion beam by means of said ion beam source;

directing said ion beam onto the surface of an object to be treated;

observing the shape of said ion beam and its location with respect to said surface of said object; and

adjusting performance characteristics of said ion beam by changing said predetermined geometric dimensions of said closed-loop ion emitting slit while observing said shape and location of said ion beam, said step of adjustment being performed by adjusting the width of said closed-loop ion emitting slit, said ion beam source having a cathode comprising a stationary part and a moveable

part, said adjustment being performed by moving said moveable part of said cathode in the direction of propagation of said ion beam.