Amplitude mask and apparatus for manufacturing long period grating filter using the same

• US 6,004,703 A
• Filed: 07/21/1998
• Issued: 12/21/1999
• Est. Priority Date: 07/21/1997
• Status: Expired due to Term

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Choi, Bo-hun, Jang, Joo-nyung, Kwack, Kyung-ho
• Primary Examiner(s): ROSASCO, STEPHEN D
• Application Number:
  US09/119,783
• Time in Patent Office: 518 Days
• Field of Search: 430/5, 430/22, 430/322, 378/35
• US Class Current: 430/5
• CPC Class Codes: G02B 6/02095 Long period gratings, i.e. transmission gratings coupling light between core and cladding modes
• CPC Class Codes: G02B 6/02142 based on illuminating or irradiating an amplitude mask, i.e. a mask having a repetitive intensity modulating pattern
• CPC Class Codes: G03F 1/50 Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
• CPC Class Codes: G03F 7/001 Phase modulating patterns, e.g. refractive index patterns

Abstract

An amplitude mask used in a long period grating filter manufacturing apparatus includes a metal substrate having a periodic transmission area having a period for selectively transmitting light and a non-transmission area through which light does not pass; and a piezo-electric transducer located on the non-transmission area of the metal substrate for changing the period of the periodic transmission area. The periodic transmission area is located in the middle of the metal substrate and the piezo-electric transducer is located on opposite sides of the periodic transmission area. Piezo-electric transducers may be located on the non-transmission area to vary the period of the periodic transmission area.

Claims

1. An amplitude mask for use in a long period grating filter manufacturing apparatus comprising:

a metal substrate having a periodic transmission area with a period for selectively transmitting light and a non-transmission area through which light does not pass; and

a piezo-electric transducer located on the non-transmission area of the metal substrate for changing the period of the transmission area.

2. The amplitude mask of claim 1, wherein the periodic transmission area is located on the metal substrate and the piezo-electric transducer is located on opposite sides of the periodic transmission area.

3. The amplitude mask of claim 2, wherein a plurality of piezo-electric transducers are located on the non-transmission area to vary the period of the periodic transmission area.

4. An apparatus for manufacturing a long period grating filter comprising a light source, a lens for controlling focus of light emitted from the light source and an amplitude mask for selectively irradiating with the light, which has passed through the lens, an optical fiber in which the long period grating is formed, wherein the amplitude mask comprises a periodic transmission area having a period for selectively transmitting the light and a non-transmission area through which the light does not pass, located on the metal substrate, and a piezo-electric transducer located on the non-transmission area for changing the period of the periodic transmission area.

5. The apparatus of claim 4, wherein the periodic transmission area is located on the metal substrate and the piezo-electric transducer is located on opposite sides of the periodic transmission area.

6. The apparatus of claim 5, wherein a plurality of piezo-electric transducers are located on the non-transmission area to vary the period of the periodic transmission area.