Surface treatment method

• US 6,006,763 A
• Filed: 03/16/1998
• Issued: 12/28/1999
• Est. Priority Date: 01/11/1995
• Status: Expired due to Term

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Takahashi, Katsuhiro, Mori, Yoshiaki, Katagami, Satoru, Miyashita, Takeshi, Miyakawa, Takuya
• Primary Examiner(s): Gulakowski, Randy
• Assistant Examiner(s): CHAUDHRY, SAEED T
• Application Number:
  US09/040,326
• Time in Patent Office: 652 Days
• Field of Search: 134/1.1, 134/1.2, 134/2, 134/26, 134/10, 438/704, 438/710, 216/57, 216/67, 216/83
• US Class Current: 134/1.1
• CPC Class Codes: B08B 3/10 with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
• CPC Class Codes: B08B 7/0035 by radiant energy, e.g. UV, laser, light beam or the like
• CPC Class Codes: C23C 8/40 using liquids, e.g. salt baths, liquid suspensions

Abstract

A method for surface treatment of a substrate is described in which a gas discharge at or about atmospheric pressure produces activated gas or active species which are then used for surface treatment of a substrate. When the discharge gas contains oxygen, for example, surface treatment forms a metal oxide film on a metal circuit on a substrate. If, however, the gas contains hydrogen or an organic substance, a metal oxide film, such as a transparent electrode formed on the surface of a liquid crystal panel, is reduced. Alternatively, by causing discharge to take place adjacent to the surface of a liquid, or bubbled through a liquid, a liquid may be used for surface treatment of a substrate without risk of thermal or electrical damage to the substrate.

Claims

1. A method of surface treatment of a substrate comprising the steps of:

converting a gas capable of discharge to a plasma state exhibiting gas discharge at or about atmospheric pressure, thereby creating active species;

exposing a liquid to said active species produced by said discharge, thereby creating activated liquid; and

exposing a substrate to the activated liquid by immersing the substrate in the activated liquid so that said substrate is surface treated.

2. A method of surface treatment of a substrate according to claim 1, wherein:

the liquid is contained in a bath where it is exposed to the active species produced by the discharge;

the activated liquid is circulated from said bath and through a purifier; and

purified liquid is returned to said bath.

3. A method of surface treatment of a substrate comprising the steps of:

converting a gas capable of discharge to a plasma state exhibiting gas discharge at or about atmospheric pressure, thereby creating active species;

exposing a liquid to said active species produced by said discharge thereby creating activated liquid; and

exposing a substrate to said activated liquid by spraying the substrate with the activated liquid so that said substrate is surface treated;

wherein the liquid is contained in bath where it is exposed to the active species produced by the discharge;

the activated liquid is collected after spraying the substrate;

the activated liquid is circulated from where it is collected and through a purifier; and

purified liquid is returned to said bath.

4. A method of surface treatment of a substrate comprising the steps of:

converting a gas capable of discharge to a plasma state exhibiting gas discharge at or about atmospheric pressure, thereby creating active species;

exposing a liquid to said active species produced by said discharge, thereby creating activated liquid; and

exposing a substrate to said activated liquid so that said substrate is surface treated, wherein the step of exposing the liquid to the active species includes causing the active species to bubble through the liquid.

5. A method of surface treatment of a substrate according to claim 4, wherein the step of exposing a substrate to the activated liquid includes:

immersing the substrate in the activated liquid.

6. A method of surface treatment of a substrate according to claim 5, wherein:

the liquid is contained in a bath where it is exposed to the active species produced by the discharge;

the activated liquid is circulated from said bath and through a purifier; and

purified liquid is returned to said bath.

7. A method of surface treatment of a substrate according to claim 4, wherein the step of exposing a substrate to the activated liquid includes:

spraying the substrate with the activated liquid.

8. A method of surface treatment of a substrate according to claim 7, wherein:

the liquid is contained in a bath where it is exposed to the active species produced by the discharge;

the activated liquid is collected after spraying the substrate;

the activated liquid is circulated from where it is collected and through a purifier; and

purified liquid is returned to said bath.