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Adjustable energy quantum thin film plasma processing system

  • US 6,007,879 A
  • Filed: 12/12/1996
  • Issued: 12/28/1999
  • Est. Priority Date: 04/07/1995
  • Status: Expired due to Term
First Claim
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1. A method of multiple power non arc-based plasma processing comprising steps of:

  • a. supplying a solid material within a coating chamber;

    b. creating a processing plasma by utilizing a switch-mode power supply which processes an area of said material within said coating chamber comprising steps of;

    i. supplying a DC input voltage;

    ii. generating an alternating signal from said DC input voltage;

    ii. converting said alternating signal to a DC output; and

    iv. applying said DC output to said processing plasma;

    c. establishing a first operating power environment for said processing plasma through utilization of said switch-mode power supply wherein said first power environment has an arc energy quantum which begins to discharge upon an arc occurrence and which is preparatory to non arc-based processing; and

    d. switching from said first operating power environment to establish a second operating power environment for said processing plasma which is powered by said switch-mode power supply wherein said second power environment has a different arc energy quantum which begins to discharge upon said arc occurrence andwherein at least said second power environment achieves said non arc-based processing, and wherein each of said first and said second operating power environments act to affect said solid material.

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