×

Annealed low emissivity coating

  • US 6,010,602 A
  • Filed: 05/12/1997
  • Issued: 01/04/2000
  • Est. Priority Date: 12/27/1994
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method of increasing the shear resistance of a sputter coating deposited on a soda-lime-silica glass substrate, the glass substrate having a strain point comprising the steps of:

  • sputter coating onto the glass substrate successive layers of an antireflective metal oxide, an infrared reflective metal, a metal primer, an antireflective metal oxide, an infrared reflective metal, a metal primer, an antireflective metal oxide and a protective overcoat, andheating the coated glass substrate to a temperature not exceeding the strain point of the glass substrate and between about 600 and 1000°

    F. (about 315 to 538°

    C.) for a time period within the range of 1 to 8 minutes to increase the shear resistance of the coating.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×