Automated washing method
First Claim
Patent Images
1. A method for automated washing of objects, comprising the following steps:
- (a) placing the objects to be washed in a chamber;
(b) exposing the objects to ultraviolet radiation;
(c) applying resist developer fluid to the objects;
(d) rinsing the resist developer;
(e) applying surfactant solution to the objects;
(f) rinsing the surfactant solution from the objects; and
blowing air into the chamber to dry the objects.
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Abstract
A system and a method for washing objects, such as cassettes and carriers used to hold and transport silicon wafers during manufacture of semiconductor chips. The method employs the steps of exposing to ultraviolet radiation the objects in a process chamber, spraying of developer fluid onto the objects, rinsing the objects, spraying of surfactant solution on the objects, rinsing the objects and drying the objects using heated, ionized ULPA filtered air. Apparatus for accomplishing the above is disclosed.
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Citations
16 Claims
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1. A method for automated washing of objects, comprising the following steps:
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(a) placing the objects to be washed in a chamber; (b) exposing the objects to ultraviolet radiation; (c) applying resist developer fluid to the objects; (d) rinsing the resist developer; (e) applying surfactant solution to the objects; (f) rinsing the surfactant solution from the objects; and blowing air into the chamber to dry the objects.
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2. A method for automated washing of objects, comprising the following steps:
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(a) placing the objects to be washed in a chamber; (b) exposing the objects to ultraviolet radiation in said chamber to insure complete exposure of any resist contamination; (c) applying resist developer fluid to the objects in said chamber; (d) rinsing the resist developer residue from the objects in said chamber; (e) applying surfactant solution to the objects in said chamber; (f) rinsing the surfactant solution from the objects in said chamber; and blowing air into the chamber to dry the objects. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9)
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10. A method for automated washing of objects employed in the manufacture of semiconductor chips, comprising the following steps:
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(a) loading contaminated objects into a process chamber; (b) applying ultraviolet radiation to the objects for a limited time in said process chamber to insure complete exposure of any resist contamination; (c) spraying resist developer fluid onto the objects in said process chamber; (d) flushing developer residue from the objects using ultra-pure water in said process chamber; (e) spraying a solution of surfactant and ultra-pure water onto the objects in said process chamber; (f) rinsing the objects and said process chamber with hot ultra-pure water; and (g) blowing heated ionized air into said process chamber to dry the objects which have been washed. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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Specification