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Three-dimensional microstructures and methods for making three-dimensional microstructures

  • US 6,018,422 A
  • Filed: 10/02/1998
  • Issued: 01/25/2000
  • Est. Priority Date: 11/30/1994
  • Status: Expired due to Fees
First Claim
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1. A method for fabricating a microstructure in a radiation-sensitive resist having a relaxed conformation, wherein the microstructure comprises a selected pattern having at least one feature with at least one non-vertical edge, said method comprising the steps of:

  • (a) reversibly deforming the resist into a three-dimensional conformation that differs from the relaxed conformation of the resist;

    (b) selectively exposing portions of the deformed resist to radiation to which the resist is sensitive;

    (c) returning the resist to the relaxed conformation; and

    (d) developing the resist either to selectively remove the radiation-exposed portions of the resist, or to selectively remove the unexposed portions of the resist;

    whereby a pattern is formed in the resist having at least one feature with at least one non-vertical edge.

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