Three-dimensional microstructures and methods for making three-dimensional microstructures

• US 6,018,422 A
• Filed: 10/02/1998
• Issued: 01/25/2000
• Est. Priority Date: 11/30/1994
• Status: Expired due to Fees

• Current Assignee: Board of Supervisors of Louisiana State University Agricultural & Mechanical College (Louisiana State University System)
• Original Assignee: Board of Supervisors of Louisiana State University Agricultural & Mechanical College (Louisiana State University System)
• Inventors: Feldman, Martin
• Primary Examiner(s): Ben, Loha
• Application Number:
  US09/165,789
• Time in Patent Office: 480 Days
• Field of Search: 359/618, 359/619, 359/621, 359/622, 359/623, 359/648, 359/649, 430/394, 430/320, 205/75
• US Class Current: 359/619
• CPC Class Codes: G02B 23/00 Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
• CPC Class Codes: G02B 3/005 arranged along a single direction only, e.g. lenticular sheets G02B3/0043 takes precedence
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085

Abstract

Methods are disclosed for making microstructures. In one method, the resist layer is reversibly deformed during exposure. When the resist is flattened and developed after exposure, non-vertical features result that are not obtainable through other existing means. One application of this method is to make nested cones suitable for use as a highly efficient x-ray lens. In another disclosed method, "halftone" lithography is used to generate microstructures having features whose height may vary continuously. One application of this method is to make a novel telescope array, a thin film having telescopic magnification properties.

Claims

1. A method for fabricating a microstructure in a radiation-sensitive resist having a relaxed conformation, wherein the microstructure comprises a selected pattern having at least one feature with at least one non-vertical edge, said method comprising the steps of:

(a) reversibly deforming the resist into a three-dimensional conformation that differs from the relaxed conformation of the resist;

(b) selectively exposing portions of the deformed resist to radiation to which the resist is sensitive;

(c) returning the resist to the relaxed conformation; and

(d) developing the resist either to selectively remove the radiation-exposed portions of the resist, or to selectively remove the unexposed portions of the resist;

whereby a pattern is formed in the resist having at least one feature with at least one non-vertical edge.

2. A microstructure fabricated by the method of claim 1.

3. A method as recited in claim 1, wherein the relaxed conformation of the resist is planar.

4. A microstructure fabricated by the method of claim 3.

5. A method as recited in claim 3, wherein the deformed three-dimensional conformation of the resist is spherical.

6. A microstructure fabricated by the method of claim 5.

7. A method as recited in claim 5, wherein said reversibly deforming step comprises applying a pressure differential across the resist.

8. A microstructure fabricated by the method of claim 7.

9. A method as recited in claim 5, wherein the selectively exposed portions of the resist comprise a plurality of circular concentric annuli, whereby the pattern formed in the developed resist comprises a plurality of nested cones.

10. A microstructure fabricated by the method of claim 9.

11. A method for fabricating a microstructure in a radiation-sensitive resist, wherein the microstructure comprises a selected pattern having at least one three-dimensional feature with a continuously variable height, said method comprising the steps of:

(a) exposing the resist to radiation to which the resist is sensitive through a mask comprising pixels of discrete absorbers of the radiation, wherein the size of the absorber in each pixel corresponds to the height of the corresponding part of the pattern; and

(b) developing the resist to selectively remove resist to a depth corresponding to the amount of radiation received by each location of the resist;

wherein said exposing step or said developing step is performed with sufficient blurring that the fine structure of the absorbers is not apparent in the developed pattern;

whereby a pattern is formed in the resist having at least one feature with a continuously variable height.

12. A microstructure fabricated by the method of claim 11.

13. A microstructure as recited in claim 12, wherein said microstructure is transparent to visible light, and wherein at least one feature on said microstructure comprises a lens with a spherical surface.

14. A microstructure as recited in claim 12, wherein said microstructure is transparent to visible light, and wherein at least one feature on said microstructure comprises a lens having a surface that is aspherical.

15. A microstructure as recited in claim 12, wherein said microstructure is transparent to visible light, and wherein said microstructure comprises an array of a plurality of lenses.

16. A combination comprising an array as recited in claim 15, and an electronic amplifier of an initial visible-light image, wherein said electronic amplifier detects and amplifies the initial visible-light image to an output of a brighter visible light image, whereby a user viewing said output image through said array will see an amplification of the initial visible-light image.

17. A combination comprising an array and electronic amplifier as recited in claim 16, and an initial array of a plurality of lenses, wherein said initial array of a plurality of lenses magnifies the initial visible light image prior to detection and amplification by said electronic amplifier.

18. A microstructure as recited in claim 15, wherein said microstructure additionally comprises opaque regions between said lenses to inhibit light from one of said lenses entering another of said lenses.

19. A combination comprising an array as recited in claim 15, and a video display, wherein the image output from the video display is input to the lenses of said array, whereby a user viewing said array from the opposite face of said array will see a magnification of the image output from the video display.

20. A combination comprising an array and a video display as recited in claim 19, and an electronic amplifier of an initial visible-light image, wherein said electronic amplifier detects and amplifies the initial visible-light image, and transmits a signal corresponding to the amplified image to the said video display, whereby a user viewing said video display through said array will see an amplified visible-light image of the infrared image.

21. A combination comprising an array, electronic amplifier, and a video display as recited in claim 20, and an initial array of a plurality of lenses, wherein said initial array of a plurality of lenses magnifies the initial visible light image prior to detection and amplification by said electronic amplifier.

22. A combination comprising an array and a video display as recited in claim 19, and an electronic amplifier of an infrared image, wherein said electronic amplifier detects and amplifies the infrared image, and transmits a signal corresponding to the amplified image to the said video display, and wherein the video display is adapted to transform the signal into a visible-light image, whereby a user viewing said video display through said array will see an amplified visible-light image of the infrared image.

23. A combination comprising an array, electronic amplifier, and a video display as recited in claim 22, and an initial array of a plurality of lenses, wherein said initial array of a plurality of lenses magnifies the initial visible light image prior to detection by said electronic amplifier.

24. A microstructure as recited in claim 12, wherein said microstructure is transparent to visible light, and wherein said microstructure comprises an array of a plurality of telescopes, each said telescope having a first lens that is spherically convex and a second lens that is spherically concave.

25. A microstructure as recited in claim 24, wherein said microstructure additionally comprises opaque regions between said telescopes to inhibit light from one of said telescopes entering another of said telescopes.

26. A microstructure as recited in claim 25, wherein said telescopes are hexagonally packed with respect to one another.

27. A microstructure as recited in claim 26, wherein the diameter of each of said lenses is between about 0.1 mm and about 1.0 mm.

28. A microstructure as recited in claim 27, wherein the diameter of each of said lenses is about 0.25 mm.

29. A method for fabricating a microstructure comprising a security mark in a radiation-sensitive resist, said method comprising the steps of:

(a) exposing the resist to radiation to which the resist is sensitive through a mask comprising pixels of discrete absorbers of the radiation, wherein the size of the absorber in each pixel corresponds to the features of the security mark; and

(b) developing the resist to selectively remove resist at locations that were exposed to the radiation, or to selectively remove resist at locations that were not exposed to the radiation;

wherein the size of one pixel, as imaged on the resist, is less than 700 nm across;

whereby a security mark is formed in the resist.

30. A microstructure fabricated by the method of claim 29.

31. A microstructure comprising a selected three-dimensional pattern having at least one three-dimensional feature with a continuously variable height in accordance with the selected pattern.