Chemical vapor deposition manifold

• US 6,024,799 A
• Filed: 07/11/1997
• Issued: 02/15/2000
• Est. Priority Date: 07/11/1997
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Littau, Karl Anthony, Chen, Chen-An
• Primary Examiner(s): Breneman, Bruce
• Assistant Examiner(s): FIELER, ERIN L
• Application Number:
  US08/890,805
• Time in Patent Office: 949 Days
• Field of Search: 118/715
• US Class Current: 118/715
• CPC Class Codes: C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C30B 25/14 Feed and outlet means for the gases; Modifying the flow of the reactive gases

Abstract

A manifold for use in a chemical vapor deposition reactor, optimized for providing effective deposition on a substrate of a specific diameter. The manifold has upstream and downstream faces and is of substantially circular shape, with a central region of the downstream face being perforated by a plurality of upstream-directed bores. The central region is substantially larger than a circle of the specific wafer diameter for which the reactor is optimized. A centrally located plurality of the bores are through-bores or holes to the upstream face of the manifold that define a gas flow path from an upstream gas source to the wafer.

Claims

1. An inlet manifold for use in a chemical vapor deposition process, comprising:

a plate defining at least a central plurality of holes which bound an upstream to downstream gas flow path, wherein one or more of the holes have an inlet at an upstream face of the manifold, an outlet at a downstream face of the manifold and an intermediate region between the inlet and the outlet of the hole, which intermediate region has a cross-sectional area smaller than cross-sectional areas of the inlet and outlet and the inlet has a cross-sectional area smaller than the cross-sectional area of the outlet.

2. The inlet manifold of claim 1 wherein the intermediate region is of uniform circular section.

3. The inlet manifold of claim 1 wherein the one or more holes have a downstream region of uniform circular section at the outlet.

4. The inlet manifold of claim 1 wherein the one or more holes have an upstream region of uniform circular section at the inlet.

5. The inlet manifold of claim 1 wherein the one or more holes have:

a downstream region of uniform circular section at the outlet;

a first conical transition region between the downstream region and the intermediate region;

an upstream region of uniform circular section at the inlet; and

a second conical transition region between the upstream region and the intermediate region.

6. The inlet manifold of claim 1 wherein the one or more holes have:

a downstream region of uniform circular section at the outlet;

a first conical transition region connecting the downstream region and the intermediate region;

an upstream region of uniform circular section at the inlet; and

a second conical transition region connecting the upstream region and the intermediate region.

7. The inlet manifold of claim 1 wherein the central plurality of holes are in a hexagonal packed array.

26. The inlet manifold of claim 7, wherein the hexagonal packed array extends over a central region of the manifold and wherein a remaining plurality of holes are spread over a peripheral portion of the manifold.

8. An inlet manifold for use in a chemical vapor deposition reactor, comprising;

upstream and downstream faces with at least a central plurality of channels extending therebetween and bounding a gas flow path through the channels, one or more of the channels having a non-uniform co-axial circular section, wherein a first region of the channels immediately adjacent the downstream face is of uniform section and joins an upstream second region immediately adjacent the upstream face having a smaller diameter than the diameter of the first region and having an intermediate region between the first and second regions smaller than the first and second regions.

9. The manifold of claim 8 wherein the second region is at least partially of conical form.

10. The manifold of claim 9 wherein the central plurality of channels are in a hexagonal array extending over a central region of the manifold.

11. The manifold of claim 8 wherein the second region is at least partially of uniform section.

12. The manifold of claim 8 wherein the intermediate region is at least partially of uniform section.

13. An inlet manifold for use in a chemical vapor deposition process, comprising:

a unitary metal plate having upstream and downstream faces and a generally flat central section, and having;

at least a central plurality of channels which bound an upstream to downstream gas flow path, one or more of the channels having an inlet at the upstream face of the manifold and an outlet at the downstream face of the manifold; and

a plurality of blind bores extending from the downstream face of the manifold and terminating prior to reaching the upstream face of the manifold.

14. The inlet manifold of claim 13 wherein the central plurality of channels are arrayed in a central portion of the manifold and wherein the plurality of blind bores are spread over a peripheral portion of the manifold radially beyond the central portion.

15. A manifold for use in chemical vapor deposition, configured for providing deposition on a wafer, comprising:

upstream and downstream faces of substantially circular shape, a region of the downstream face being perforated by a plurality of upstream-directed bores, and wherein the perforated region is substantially larger than a projected perimeter of a wafer to be processed.

16. The manifold of claim 15 wherein a centrally located plurality of the bores are trough-bores to the upstream face of the manifold, the through-bores defining a gas flow path from an upstream gas source to a downstream wafer, and wherein a remaining plurality of the bores have no through-flow of gas.

17. The manifold of claim 16 wherein substantially all of the remaining plurality of bores are blind bores terminating without reaching the upstream face of the manifold.

18. The manifold of claim 15 wherein one or more of the bores of the perforated region are through-bores extending from the upstream to the downstream faces of the manifold and wherein a remaining plurality of bores are substantially close packed in a region peripheral to the perforated region.

19. The manifold of claim 15 wherein the region perforated by the plurality of upstream-directed bores has a diameter at least 105% of the projected wafer perimeter.

20. The manifold of claim 19 wherein the region perforated by the plurality of upstream-directed bores has a diameter of 110-120% of the projected wafer perimeter.

27. The manifold of claim 15, wherein the perforated region fully overlaps the projected perimeter of a wafer to be processed.

21. An inlet manifold for use in a chemical vapor deposition reactor, comprising:

upstream and downstream faces with at least a central plurality of channels extending therebetween and bounding a gas flow path through the channels; and

means for reducing aluminum fluoride deposits on the downstream face of the manifold, wherein the reducing means are located at least in part at a radial distance from a central axis of the manifold greater than a radius of a substrate on which a film will be deposited by the reactor.

22. A chemical vapor deposition reactor, comprising:

a reactor chamber;

a gas delivery system coupled to the chamber;

a substrate holder disposed in the chamber;

a heater coupled to the substrate holder; and

a face plate, comprising;

an upper face and a lower face, the lower face in substantially parallel facing relation to an upper face of the substrate holder, a region of the lower face being perforated by a plurality of upward-directed bores, and wherein the perforated region is larger than a projected perimeter of a wafer to be processed.

23. The reactor of claim 22 wherein one or more of the bores are of non-uniform co-axial circular section, wherein a first region of the bores immediately adjacent the lower face is of uniform section and joins an upper second region of smaller diameter than the diameter of the first region.

24. The reactor of claim 22 wherein one or more of the bores have an inlet at the upper face of the face plate, an outlet at the lower face of the face plate, where the inlet has a smaller cross-sectional area than an outlet cross-sectional area and an intermediate region between the inlet and outlet of the bore, which intermediate region has a cross-sectional area smaller than cross-sectional areas of the inlet and outlet.

25. The reactor of claim 24 wherein one or more of the bores have:

a lower region of uniform circular section at the outlet;

a first conical transition region between the lower region and the intermediate region;

an upper region of uniform circular section at the inlet; and

a second conical transition region between the upper region and the intermediate region.