Planarizing method for fabricating an inductive magnetic write head for high density magnetic recording
First Claim
1. A method for forming a magnetic transducer head comprising:
- providing a substrate;
forming over the substrate a lower magnetic pole layer;
forming upon the lower magnetic pole layer a gap filling layer which is substantially planar;
forming through a first photolithographic method upon the gap filling layer a patterned upper magnetic pole tip layer;
etching a while employing the patterned upper magnetic pole tip layer as a etch mask layer, the gap filling layer and the lower magnetic pole layer to form a patterned gap filling layer and an etched lower magnetic pole layer having a lower magnetic pole tip integral thereto, where the patterned gap filling layer and the lower magnetic pole tip are aligned with an etched patterned upper magnetic pole tip layer formed from the patterned upper magnetic pole tip layer;
forming upon the etched patterned upper magnetic pole tip layer and the etched lower magnetic pole layer a backfilling insulator layer, the backfilling insulator layer being formed to a thickness greater than a thickness of the etched patterned upper magnetic pole tip layer plus a thickness of the patterned gap filling layer plus a thickness of the lower magnetic pole tip;
planarizing the backfilling insulator layer to form a patterned planarized backfilling insulator layer an exposed upper surface of which is coplanar with an exposed upper surface of the etched patterned upper magnetic pole tip layer; and
forming through a second photolithographic method a patterned upper magnetic pole layer contacting the exposed upper surface of the etched patterned upper magnetic pole tip layer.
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Accused Products
Abstract
Within a method for forming a magnetic transducer head there is first provided a substrate having formed thereover a lower magnetic pole layer in turn having formed thereupon a gap filling layer which is substantially planar. There is then formed upon the gap filling layer a patterned upper magnetic pole tip layer which serves as an etch mask layer for forming from the gap filling layer and the lower magnetic pole layer a patterned gap filling layer and an etched lower magnetic pole layer having a lower magnetic pole tip integral thereto, while simultaneously forming an etched patterned upper magnetic pole tip layer from the patterned upper magnetic pole tip layer. There is then formed upon the etched patterned upper magnetic pole tip layer and the etched lower magnetic pole layer a backfilling insulator layer to a thickness greater than a thickness of the etched patterned upper magnetic pole tip layer plus a thickness of the patterned gap filling layer plus a thickness of the lower magnetic pole tip. There is then planarized the backfilling insulator layer to form a patterned planarized backfilling insulator layer an exposed upper surface of which is coplanar with an exposed upper surface of the etched patterned upper magnetic pole tip layer. Finally, there is then formed a patterned upper magnetic pole layer contacting the exposed upper surface of the etched patterned upper magnetic pole tip layer.
43 Citations
11 Claims
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1. A method for forming a magnetic transducer head comprising:
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providing a substrate; forming over the substrate a lower magnetic pole layer; forming upon the lower magnetic pole layer a gap filling layer which is substantially planar; forming through a first photolithographic method upon the gap filling layer a patterned upper magnetic pole tip layer; etching a while employing the patterned upper magnetic pole tip layer as a etch mask layer, the gap filling layer and the lower magnetic pole layer to form a patterned gap filling layer and an etched lower magnetic pole layer having a lower magnetic pole tip integral thereto, where the patterned gap filling layer and the lower magnetic pole tip are aligned with an etched patterned upper magnetic pole tip layer formed from the patterned upper magnetic pole tip layer; forming upon the etched patterned upper magnetic pole tip layer and the etched lower magnetic pole layer a backfilling insulator layer, the backfilling insulator layer being formed to a thickness greater than a thickness of the etched patterned upper magnetic pole tip layer plus a thickness of the patterned gap filling layer plus a thickness of the lower magnetic pole tip; planarizing the backfilling insulator layer to form a patterned planarized backfilling insulator layer an exposed upper surface of which is coplanar with an exposed upper surface of the etched patterned upper magnetic pole tip layer; and forming through a second photolithographic method a patterned upper magnetic pole layer contacting the exposed upper surface of the etched patterned upper magnetic pole tip layer. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method for forming an inductive write-magnetoresistive (MR) read magnetic transducer head comprising:
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providing a substrate, the substrate having a first side and a second side; forming over the first side of the substrate a magnetoresistive (MR) sensor element layer; forming over the first side of the substrate a lower magnetic pole layer; forming upon the lower magnetic pole layer a gap filling layer which is substantially planar; forming through a first photolithographic method upon the gap filling layer a patterned upper magnetic pole tip layer; etching, while employing the patterned upper magnetic pole tip layer as a etch mask layer, the gap filling layer and the lower magnetic pole layer to form a patterned gap filling layer and an etched lower magnetic pole layer having a lower magnetic pole tip integral thereto, where the patterned gap filling layer and the lower magnetic pole tip are aligned with an etched patterned upper magnetic pole tip layer formed from the patterned upper magnetic pole tip layer; forming upon the etched patterned upper magnetic pole tip layer and the etched lower magnetic pole layer a backfilling insulator layer, the backfilling insulator layer being formed to a thickness greater than a thickness of the etched patterned upper magnetic pole tip layer plus a thickness of the patterned gap filling layer plus a thickness of the lower magnetic pole tip; planarizing the backfilling insulator layer to form a patterned planarized backfilling insulator layer an exposed upper surface of which is coplanar with an exposed upper surface of the etched patterned upper magnetic pole tip layer; and forming through a second photolithographic method a patterned upper magnetic pole layer contacting the exposed upper surface of the etched patterned upper magnetic pole tip layer. - View Dependent Claims (8, 9, 10, 11)
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Specification