Apparatus for improved remote microwave plasma source for use with substrate processing systems
First Claim
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1. A remote microwave plasma apparatus comprising:
- a body defining a resonant cavity and having a fluid inlet and a fluid outlet;
a source of microwave energy in electrical communication with said cavity; and
a microwave arrestor positioned within said fluid outlet, extending coextensive with a cross-sectional area of said fluid outlet.
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Abstract
An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.
80 Citations
28 Claims
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1. A remote microwave plasma apparatus comprising:
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a body defining a resonant cavity and having a fluid inlet and a fluid outlet; a source of microwave energy in electrical communication with said cavity; and a microwave arrestor positioned within said fluid outlet, extending coextensive with a cross-sectional area of said fluid outlet. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. An improved substrate processing system comprising:
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a processing chamber; a gas delivery system configured to deliver a reactive gas to said processing chamber; a heating system including a pedestal in said processing chamber, said pedestal for holding a substrate, said pedestal being heated to a selected temperature; a vacuum system configured to set and maintain a selected pressure within said processing chamber; a remote microwave plasma system coupled to said processing chamber, said remote microwave plasma system comprising, a conductive plasma applicator defining an internal volume, said applicator including, a first end wall, said first end wall including a microwave-transparent plate, a conductive second end wall opposite said first end wall, a gas inlet for receiving a reactive gas into said internal volume of said applicator, and an outlet, said gas inlet and said outlet equipped with microwave arrestors. - View Dependent Claims (23, 24, 25, 26, 27, 28)
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Specification