Method for producing tapered waveguide
First Claim
1. A method for producing a tapered waveguide, comprising the steps of:
- forming an undercut shadow mask having an overhanging part on a substrate;
causing film-forming particles to jump from above the shadow mask toward the substrate, thereby forming a dielectric film having a tapered part on the substrate;
removing the shadow mask together with the film-forming particles thereon by lift-off; and
forming an optical waveguide layer on the substrate so as to cover the dielectric film having the tapered part,wherein the undercut shadow mask includes a photoresist layer having an overhanging part and a metal layer having a thickness of in the range of about 0.1 to 10 μ
m for supporting the photoresist layer above the substrate.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for producing a tapered waveguide is produced using an undercut-type shadow mask having an overhanging part. The shadow mask includes a photoresist layer having the overhanging part and a metal layer for supporting the photoresist layer on a substrate. After the shadow mask is provided on the substrate, film-forming particles are caused to jump from above the shadow mask toward the substrate, thereby forming a dielectric film having a tapered part on the substrate. Then, the shadow mask is removed together with the film-forming particles thereon by lift-off. Then, an optical waveguide is formed on the substrate so as to cover the dielectric film having the tapered part. The thickness of the metal layer is preferably in the range of about 0.1 to 10 μm and more preferably about 1 μm.
28 Citations
10 Claims
-
1. A method for producing a tapered waveguide, comprising the steps of:
-
forming an undercut shadow mask having an overhanging part on a substrate; causing film-forming particles to jump from above the shadow mask toward the substrate, thereby forming a dielectric film having a tapered part on the substrate; removing the shadow mask together with the film-forming particles thereon by lift-off; and forming an optical waveguide layer on the substrate so as to cover the dielectric film having the tapered part, wherein the undercut shadow mask includes a photoresist layer having an overhanging part and a metal layer having a thickness of in the range of about 0.1 to 10 μ
m for supporting the photoresist layer above the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
-
10. A method for producing a tapered waveguide, comprising the steps of:
-
forming a metal layer on a substrate; forming a patterned photoresist layer on the metal layer; etching the metal layer by an etchant formed of one of an acid and a mixture of an acid, using the photoresist layer as a mask, thereby forming an undercut shadow mask having an overhanging part on the substrate; causing film-forming particles to jump from above the shadow mask toward the substrate, thereby forming a dielectric film having a tapered part on the substrate; removing the shadow mask together with film-forming particles thereon by lift-off; and forming an optical waveguide layer on the substrate so as to cover the dielectric film having the tapered portion.
-
Specification